Other specifications of packaging can be provided according to customer requirements
Phosphoane mixed gas
| Purity or Quantity | carrier | volume |
| 99.999%/99.9999% | cylinder | 47L |
Phosphoane mixed gas
Phosphine is an important n-type doping source in the manufacture of semiconductor devices. It is also used in polysilicon chemical vapor deposition, epitaxial GaP materials, ion implantation process, MOCVD process, and preparation of phosphosilicate glass (PSG) passivation film.
Applications
Semiconductor
Solar Photovoltaic
LED
Machinery Manufacturing
Chemical Industry
Medical Treatment
Food
Scientific Research
