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Semiconductor Industry

We provide integrated circuit/semiconductor customers with various special gases required for processes such as diffusion, lithography, deposition, etching, doping, and cleaning.

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Nitrogen trifluoride

The chemical reaction between the electron gas and the object to be etched is required in the etching industrial process. In the etching process of wafer manufacturing, it is necessary to use an electron-specific gas to remove the etched part to achieve the purpose of directional etching.

Silane

In the semiconductor industry, silane is mainly used to manufacture high-purity polysilicon, silicon dioxide film, silicon nitride film, polysilicon isolation layer, etc., and can also be used to manufacture solar cells, optical fibers and photoelectric sensors, etc.

Gasmixture

As an electron gas, nitrous oxide is mainly used in the dielectric thin film process for the development and production of semiconductor optoelectronic devices. It is an irreplaceable key concept gas that directly affects the quality of optoelectronic devices.

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