Disproportionation Process in Silane Gas Production
With the rapid advancement of technology, developing new productive forces and promoting high-quality development have become key focuses for national growth. In cutting-edge fields such as chips, display panels, photovoltaics, and battery materials, silane plays a crucial role as a key raw material. Currently, only a few countries around the world can independently produce electronic-grade silane gas.
HuaZhong Gas uses the industry’s advanced disproportionation process to produce electronic-grade silane gas. This process not only maintains purity and production capacity but also reduces environmental impact, fulfilling the company’s commitment to green and sustainable development.
The disproportionation process refers to a chemical industrial reaction where elements in an intermediate oxidation state simultaneously undergo oxidation and reduction, generating two or more different products with varying oxidation states. The disproportionation of chlorosilanes is a series of reactions that utilize the chlorosilane to produce silane.
First, silicon powder, hydrogen, and silicon tetrachloride react to form trichlorosilane:
Si + 2H2 + 3SiCl4 → 4SiHCl3.
Next, trichlorosilane undergoes disproportionation to generate dichlorosilane and silicon tetrachloride:
2SiHCl3 → SiH2Cl2 + SiCl4.
Dichlorosilane then undergoes further disproportionation to form trichlorosilane and monohydrosilane:
2SiH2Cl2 → SiH3Cl + SiHCl3.
Finally, monohydrosilane undergoes disproportionation to produce silane and dichlorosilane:
2SiH3Cl → SiH2Cl2 + SiH4.
HuaZhong Gas integrates these processes, creating a closed-loop production system. This not only reduces waste but also increases the utilization rate of raw materials, effectively lowering production costs and environmental impact.
In the future, HuaZhong Gas will continue to optimize reaction parameters and provide high-quality electronic-grade silane gas to support the advancement of industrial development and contribute to high-quality growth!

