Umzi mveliso we-semicondcuctor, njengoncedo lophuhliso lobuchwephesha lwale mihla, lubandakanya igesi eliphezulu kunye negesi eliphezulu lenkqubo yokwenziwa kwemveliso. Iigesi ezikhethekileyo ze-Secomandors zibhekisa kwiigesi ezidlala indima ephambili kwimveliso ye-semicondutor, ukuvelisa i-chiip, ifilimu yefilimu, kunye nezinye iinkqubo. Ezi gesi kufuneka zifezekise iimfuno ezingqongqo ukuba zicocekile, uzinzo, kunye nokulawula iinkqubo zokuphendula. Eli nqaku liza kwazisa iigesi ezikhethekileyo eziqhelekileyo ezisetyenziswa kwi-semico andixoxe kwaye zixoxe ngeendima zabo kwinkqubo yokwenza i-semicondcuctory.

1. I-hydrogen (h₂)

Hydrogen isetyenziswa ngokubanzi kwimveliso ye-semiconductor, ngakumbi kwi-Vapor Vapor Vapor Piposite (CVD) kunye nokuncitshiswa kwendlela. I-CVD, i-hydrogen ihlala ixutywe nezinye iigesi ukukhulisa iifilimu ezincinci, ezinjengeefilimu zesilika. I-hydrogen ikwasebenza njenge-arhente yokucutha kwi-arhente yentsimbi kunye neenkqubo zokukhupha i-oxide. Ukongeza, i-hydrogen isetyenziswa ekucoceni nasekusombululeni i-semicionductor ye-semicionductor ukuba isuse ngempumelelo indawo engcolileyo kwaye iphucule umgangatho weetshipsi.

2. I-nitrogen (n₂)

Initrogen, Irhasi ye-Intert, isetyenziswa ikakhulu ukubonelela ngendawo engenamagama eoksijini kwimveliso ye-semicondcucto. Iqhelekile isetyenziselwa ukucoca, iinkqubo zokupholisa, kwaye njengendawo engaqhelekanga kwi-Atmospheres. Kwiinkqubo ze-vapor kunye neenkqubo ze-etching, i-nitrogen ihlala idityaniswa nezinye iigesi zokuzinzisa iimeko zokuphendula kunye nokulawula izinga lokuphendula. I-Nitrogen ikwasetyenziselwa ukucinezela i-oxidation, ukukhusela izixhobo ezibuthathaka kumonakalo we-oxidation.

3. Ioksijini (o₂)

Ioksijini Idlala indima ebalulekileyo kwishishini le-semicondctor, ngakumbi iinkqubo ze-oxidation. Kwimo ye-Silicon Dioxide Father kumphezulu we-seficko ye-silicon ye-sefir, ioksijini ibalulekile. Ngokwazisa ioksijini, i-iyunifomu ye-oxidem ye-oxide kumgangatho wesilika, obaluleke kakhulu ekusebenzeni kombane kunye nokuzinza kwesixhobo. Ioksijini ikwasetyenziswa kwiinkqubo zokucoca kunye ne-elching, uphendula nezinye iigesi zekhemikhali ukwenza i-oxiles okanye isuse iifilimu ezithile zensimbi.

4. I-carbon ttrafluoride (CF₄)

I-Carbon Tetrafluoride isetyenziswa ngokubanzi kwiinkqubo zokuphucula. Kwi-semiconductor ye-semiconductor, i-CF₄ ixutywe nezinye iigesi ukususa iifilimu ezincinci ze-silicon, i-siticon nitride, intsimbi, kunye nezinye izinto. Xa i-CF₄ idibanisa ne-fluorine, yenza i-fluorides, enomhlaba onamandla kwaye unokuphumelela ngokufanelekileyo. Le rhasi ibalulekile ukuze ihambelane nemeko yokuchaneka okuphezulu kwimveliso yesekethe.

5. I-hydrogen chloride (i-HCL)

Irhasi ye-hydrogen cherider isetyenziswa ngokuyintloko njengegesi ye-etching, ngakumbi kwi-etching yezinto zentsimbi. Inika ingxelo ngeefilimu zensimbi ukuze isebenze i-chloride, ivumela iindawo zentsimbi ukuba zisuswe. Le nkqubo isetyenziswa ngokubanzi kwipateni yeefilimu zensimbi ezincinci, ukuqinisekisa ukuchaneka kwezakhiwo ze-Chip.

6. I-Nitrogen Trifluoride (NF₃)

I-nitrogen trifluoride isetyenziselwa ikakhulu ukuhlalisa i-Propotidation Izixhobo zePlasma ye-etching. Kwiinkqubo zokuqhuba iPlasma e-Etching, i-NF₃ iphinda ihlawule izixhobo ezifakwe kwi-Silicon fluoors) ukwenza i-fluorides ekhutshelweyo. Le rhasi isebenza kakhulu kwinkqubo yokucoca, inceda ukugcina ukucoceka kwezixhobo ze-etching kunye nokuphucula ukuchaneka kunye nokusebenza kakuhle kweenkqubo zemveliso.

7. ISilane (Sih₄)

I-Silane yirhasi esetyenziswayo esetyenzisiweyo kwi-Vapor ye-Vapor yePhemikhali (i-CVD), ngakumbi ekubekeni iifilimu ezinqabileyo ze-silicon. USilane ubola kubushushu obuphezulu ukuba benze iifilimu ze-silicon kumhlaba omkhulu, obaluleke kakhulu kwimveliso ye-semicondcucture. Ngokulungelelanisa ukuhamba kweSilane kunye neMeko yokuphendula, inqanaba lokufundela kunye nomgangatho wefilimu unokulawulwa ngokuchanekileyo.

8. I-boron trifluoride (bf₃)

I-Boron Trifluoride yirhasi ebalulekileyo, esetyenziswayo kwi-boron ihamba ngenkqubo ye-semicondcuction. Isetyenziselwa ukuhlengahlengisa iipropathi zombane zekristale ngokusabela kwi-Silicon Ficerate ukuba yenze umaleko onqwenelekayo. Inkqubo ye-Boron ibalulekile ekuphumezeni izixhobo ze-P-CEBE ZEEMIOnductor, kwaye irhasi ye-bf₃ idlala indima ebalulekileyo kule nkqubo.

9. I-Sulfuur Hexusluoride (SF₆)

I-Sulfuur Hexusluoride Isetyenziswa ikakhulu kwiinkqubo ze-semiconductor ezithobekileyo, ngakumbi kwi-etching egudileyo. Ngenxa yokufaka umbane okuphezulu kombane kunye nokuzinza kweekhemikhali, i-SF₆ inokudityaniswa nezinye iigesi ukususa ngokuchanekileyo iifilimu zezinto ezibonakalayo kwaye kuqinisekiswe iipateni ezichanekileyo. Ikwasetyenziswa ngokubanzi kwi-ion ye-ion, ngokukuko ukususa iifilimu zensimbi engafunekiyo.

Ukuqukumbela

Iigesi ezikhethekileyo ze-semiortuctors zidlala indima engenakufanela ekwenzeni imijikelezo emisiweyo. Njengoko itekhnoloji iyaqhubeka ukuqhubela phambili, ibango lokucoceka okuphezulu kunye nokusebenza kwezi gesi kunyuka, khuthaza abathengisi ukuba banyuse umgangatho kunye neentlobo zegesi. Kwixa elizayo, ishishini le-semicondcuctor liza kuqhubeka lixhomekeke kwezi gesi ezikhethekileyo ukuxhasa ukuveliswa kweetshiphu ezilandelayo ze-chips kunye nezinto ezinobuchwepheshe. Ke ngoko, ukuqonda kunye nokusebenzisa i-semicontuctor ye-semiconductor ye-semiconductor kuya kuba yinto ebaluleke kakhulu ekuqhubeni uphuhliso oluqhubekayo lomzi mveliso we-semicondcuctor.