Ububiko bw'inganda bwo hejuru bushoboje bushoboza gukora cyane
Ammonia yinganda (NH₃) Yakozwe hakoreshejwe tekinoroji yateye imbere hamwe na sisitemu yo kugenzura ubuziranenge, afite ubuziranenge bwa 99.999% (icyiciro cya 5), guhuza ibisabwa na gaze mu mirima yo gukora neza, imbaraga nshya, n'imiti mishya, n'imiti mishya, n'imiti mishya. Ibicuruzwa byubahiriza GB / T 14601-2021 "Ammonia yinganda" hamwe na Semi mpuzamahanga, iso nibindi bisobanuro, kandi bifite umutekano n'umutekano byinshi.
Ni ubuhe buryo bwo gukoresha AmoniMia inganda?
Pan-semiconductor na elegitoronike yo gukora
Chip / Panel Umusaruro: Byakoreshejwe kuri Silicon Nitride / Gallium Nitride yo kubitsa muri firime no kugashyiraho ibitekerezo kugirango hakemurwe neza.
Inganda zayobowe: Byakoreshejwe nk'isoko ya azote yo kubyara ibice bya Gan kugirango bitezimbere imikorere yo gusohora urumuri.
Ingufu nshya hamwe na PhotoVeltaics
Ingirabuzimafatizo z'izuba: Gabanya Nitride ya Nitride irwanya mu buryo bwo kwerekana mu buryo bwa Pecvd kugirango utezimbere ihinduka ryafotora.
Kuvura hejuru no gutunganya icyuma
Icyuma nitide: gukomera kubice bya mashini kugirango birusheho kurwanya no kurwanya umunaniro.
Kurinda gusumura: Nka gaze yo kugabanya kugirango wirinde okiside yubushyuhe bwimiterere yibyuma.
Kurinda imiti no kugondwa
Gutandukana no kugabanuka kwuzuye: Byakoreshejwe mu kwamagana ibicuruzwa mu bihe by'ubushyuhe / ibihingwa bya shimi bigabanya imyuka ya azote (Nox).
Synthesis Sympesis: Ibikoresho byibanze byibanze byo gukora ibikoresho byibanze bya chimique nka Urea na acide ya nitric.
Ubushakashatsi bwa siyansi n'ubuvuzi
Isesengura rya laboratoire: ikoreshwa nka gaze ya gaze cyangwa gaze yo gukora ubushakashatsi na synthesis.
Ubushyuhe-buke bwo kunyereza: Uburyo bwingenzi mubikorwa byo gusoza ibikoresho byubuvuzi kugirango umutekano wihuse.
Inyungu z'ibicuruzwa: kwezwa kugeza kuri 99.999% +, umwambaro ≤0.1ppm, bikwiranye n'ibikenewe byo hejuru; Gutanga byoroshye (silinderi / kubika tank / tank ikamyo), gahunda yuzuye yumutekano.
Ni ubuhe bwoko butatu bwa Ammonia yinganda?
Ikoresha: Ibyuma Nitride Harddeni, Synthesis (Urea / Nitric acide), kurengera isukura, ubumuga bwangiza ibidukikije (SCR).
Ibiranga: isuku ≥ 99.9%, iterana ibyifuzo rusange byinganda, bifite akamaro.
Icyiciro cya elegitoroniki cyisumbuye Ammonia
Ikoresha: Imikino ya Semiconductor (Silicon Nitride ya Silicon), iterambere rya Licotaxial, selile ya PhotoVoltaic (urwego rwa Pecvd Anti-Kugaragaza).
Ibiranga: isuku ≥ 99.999% (icyiciro cya 5), umwanda wingenzi (H₂o / O₂) ≤ 0.1ppm, kwirinda umwanda.
Amazi ya Ammonia
Ikoresha: Umusaruro munini-munini (nka synthique ammonia), sisitemu yo gutunganya inganda, umukozi wo kwagura amavuta.
Ibiranga: Ububiko-bwikirere bubi, imikorere yo gutwara abantu cyane, ikwiranye nibisanzwe.
Nigute Ammonia inganda yakozwe?
Synthesis zifatika (cyane cyane inzira ya haber)
Ibikoresho fatizo: hydrogen (H₂, kuva ku ivugurura rya gaze / amazi ya electrolysis) + azote (n₂, byakozwe no gutandukana ikirere).
Imyitwarire: Imyanya ishingiye ku ibyuma bya Catalyze synthesi ya nh₃ ku bushyuhe bwo hejuru (400-500 ℃) hamwe nigitutu kinini (15-25MMPA).
Gusunika Gazi
Gutera imbaraga / decardbolisation: Kuraho umwanda nka sulfide na co kuva gaze mbisi binyuze muri adsorbents (nko guhagarika karubone) kugirango wirinde uburozi bwa catalyst.
Ammonia yo kwezwa
Iminota myinshi itunganijwe: Koresha ubushyuhe-buke-ubushyuhe bwo gutandukana (-33 ℃ Gutandukana Kumuboneza) + Kuraho ibice bya Micron) kugirango ubone isuku ≥99.99.999% (icyiciro cya elegitoroniki).
Ububiko no gupakira
Leta ya gaze: Ikanda ryuzura muri silinderi yicyuma (40l isanzwe).
Leta y'amazi: Ububiko mu bigega byo kubika cyangwa amakamyo ya tank nyuma yubushyuhe buke bwa liquefaction kugirango bitezimbere imikorere myiza.
Ammonia yashyizwe mu kaga?
Gutondekanya kurwego rwuzuye
Icyiciro cy'inganda
Isuku: ≥99.9%
Ikoreshwa: Synthesis Synthesis (Urea / Nitric acide), icumbi rya Nitride, Gutandukana Ibidukikije (SCR), Kurinda.
Ibiranga: Igiciro gito, gikwiye kuri scenarios rusange.
Icyiciro cya elegitoroniki cyisumbuye Ammonia
Isuku: ≥99.999% (icyiciro cya 5)
Ikoresha: Semiconductor yo Gukuramo Filime (Silicon Nitride / Gallium Nitride), gukura kwa Licotaxial
Ibiranga: Umwanda (H₂o / O₂) ≤0.1ppm, irinde gutunganya ibishushanyo mbonera, igiciro kinini.
Kwitondera muburyo bwumubiri
Ibihimbano
Gupakira: Umuvuduko ukabije wicyuma (nka 40l amacupa ya 40l), byoroshye gukoresha amazi make yoroshye.
Scenario: laboratoire, uruganda ruto, gaze ya gaze.
Amazi ya Ammonia (Ammonia y'amazi)
Ububiko: Ubushyuhe buke hamwe nigitutu kinini
Ibice binini-bya synthesis (nk'ifumbire), ubumuga bwo kwamagukana mu bushyuhe (SCR), sisitemu yo gukonja inganda.
Igabanijwemo no gusaba
Ammoni yimiti: Ibikoresho byibanze bya chimique nka synthetic urea na acide ya nitric.
Imyuga idasanzwe ya elegitoroniki: Uburinganire-bwenge muri semiconductor, PhotoVeLetic, no gukora inganda.
Ibidukikije Ibidukikije: Imbaraga zubushyuhe / Guhama imiti no kugabanuka kwuzuye (inzira ya scr).
Ubuvuzi Ammonia: Ubushyuhe-buke bwo kunyereza, gusesengura laboratoire.
Uruganda rugaragaza rute Ammonia?
Imyuka mugihe cyo gukora no gukoresha
Synthetic ammonia igihingwa: Gutunga imyanda, ibikoresho bya kashe ntabwo bikaba bikaba bikaba bishingiye ku kumeneka.
Igihingwa cya chimique / elegitoroniki: Mugihe ukoresheje Ammonia kugirango nayo and Etching, gaze isigaye itakiriwe neza.
Ububiko no gutwara abantu: kumeneka ku mpanuka byatewe no gusaza tanki / imiyoboro, kunanirwa cyangwa amakosa akora.
Ingamba zo kugenzura
Gukumira tekinike no kugenzura: Gufata inzira ifunze umusaruro, shyira umunara wa scr / adsorption kugirango uvure gaze.
Gukurikirana Iyubahwa: Detector yigihe nyayo + Gukurikirana Amashusho ya Infraf, yubahiriza ibisabwa "Gukumira ikirere no kurwanya amategeko" hamwe n'amategeko.
Gazi ya HUAZHON iratanga Ammonia yo mu rwego rwo hejuru, kuzigama-kuzigama neza no gukora neza umusaruro, uburyo bworoshye kandi butandukanye. Ibicuruzwa byacu byujuje ubuziranenge mpuzamahanga kugirango habeho ibisubizo byihutirwa kandi byizewe kubintu byose byubuzima.
