Manufar masana'antu ya dogara da gas iri-iri, wanda za'a iya rarrabe su cikin manyan nau'ikan guda uku: Manyan gas, Gases na Gaske, da gas na etching. Waɗannan gas ɗin dole ne na tsarkakakkiyar tsabta don hana gurbatawa, wanda zai iya lalata m da hadaddun fashin halitta.

Manyan gas

Nitrogen (n₂):

Matsayi: N₂ yana aiki da dalilai da yawa, gami da tsarkakewa kamannin ɗakunan ajiya da samar da yanayi mara iyaka yayin matakai daban-daban na masana'antu.
Bayanan sanarwa: Nitrogen galibi ana aiki da shi a cikin sufuri da kuma adana silicon sons ya rage oxidation. Yanayinta yana tabbatar da cewa ba ya amsawa da wasu kayan, yana sa ya dace don kiyaye mahalli na sarrafawa.

Argon (Ar):
Matsayi: Bugu da ƙari ga haɗewa a cikin tafiyar matakai na plasma, Argon yana da matukar mahimmanci a cikin matakai inda abin da aka sarrafa gas ɗin da ke sarrafawa yana da mahimmanci.
Aarin bayanin kula: saboda ba ya amsawa da yawancin kayan, Argon ana amfani da shi don shafawa, wanda ke taimakawa wajen ajiye ƙarfe ko fim ɗin da dole ne a kiyaye su ba tare da gurbata ba.

Helium (shi):
Matsayi: Abubuwan da ke da ƙarancin kayan aikin Helium suna ba shi da mahimmanci don sanyaya da kuma kula da daidaiton zazzabi yayin aiwatarwa.
Bayanan sanarwa: galibi ana amfani dashi a tsarin laserarancin makamashi don almara saboda yanayin da bai dace ba da kuma ikonsa don kula da hanyar fitarwa ba tare da ƙazanta ba.

Hydrogen (H₂):
Matsayi: Fiye da aikace-aikacensa a cikin fushi, hydrogen kuma yana taimakawa wajen tsabtace farfajiya na wafers kuma yana iya shiga cikin halayen sunadarai yayin aikin sunadarai.
Aarin bayanin kula: Amfani da hydrogen a cikin ajiya na bakin fina-finai yana ba da iko mafi girma akan kayan jigilar kaya mai mahimmanci.

Gases na Gaske da Kafe

Silane (sih ₄):
Role: Apart from being a precursor for silicon deposition, silane can be polymerized into a passivating film that improves electronic characteristics.
Additionarin bayanin kula: Haɗuwa na buƙatar kulawa sosai saboda damuwa na aminci, musamman lokacin da aka haɗe da iska ko oxygen.

Ammoniya (NH₃₃):
Matsayi: Baya ga samar da fina-finai na Nitride, ammoniya mai mahimmanci ne wajen samar da yadudduka wadanda ke inganta amincin na'urorin semicontionctor.
Bayanarin Bayani: Zai iya shiga cikin matakai wanda ke buƙatar haɗakar Nitrogen cikin silicon, inganta kaddarorin lantarki.

Phosphine (PH₃), Arsine (Ash₃), da Dibora (B₂₆):
Matsayi: Waɗannan gas ba su da mahimmanci kawai don ƙwayoyin kuɗi amma suna da matukar muhimmanci ga cimma nasarar kaddarorin da ake so a cikin na'urorin semiconductor.
Bayanarin Bayani: Mahimmancinsu ya wajaba da tsayayyen aminci da kuma saka idanu a cikin yanayin lalata don rage haɗarin haɗari.

Etching da tsabtatawa gas

Flurourocarbons (CF₄, SF₆):
Matsayi: Waɗannan gas suna aiki a cikin matakai na bushewar abubuwa, waɗanda ke ba da daidaitaccen abin da aka kwatanta da rigar ETching.
Bayanan sanarwa: CF₄ da Sf₆ suna da mahimmanci saboda iyawarsu na samar da silicon yadda yakamata, bada izinin daidaitaccen tsarin ƙuduri a cikin microolronics.

Chlorine (cl) da hydrogen Flororide (HF):
Matsawa: Chlorine yana samar da iyawar mahaifa, musamman ga karafa, yayin da HF yana da mahimmanci ga silicon dioxide.
Aarin Bayani: Haɗin waɗannan gas ɗin yana ba da damar ingancin cirewar Layer a cikin matakai daban-daban, tabbatar da tsabtatawa farfajiya don matakai masu zuwa.

Nitrogen TriflUoride (nf₃):
Matsayi: Nf₃ shine pivotal don tsabtatawa muhalli a cikin tsarin CVD, yana amsa da ƙwarewa don kula da kyakkyawan aiki.
Bayanarin Bayani: Duk da damuwa game da ƙirar gas mai gas, NF₃ a cikin tsabtatawa ya zaɓi da yawa masana'antu, kodayake amfani da shi yana buƙatar la'akari da muhalli da yawa.

Oxygen (o ₂):
Matsayi: Tsarin iskar shaye-shaye yana sauƙaƙe ta hanyar oxygen na iya ƙirƙirar mahimman shimfidar shimfidar wuri a cikin tsarin yanayin Semiconduction.
Aarin bayanin kula: Matsakaicin oxygen wajen haɓaka iskar shaka ta oxygen don inganta silicon don samar da siiibow yana da mahimmanci ga ware kuma kariya ta kayan haɗin kewaye.

Abubuwan da suka fito a cikin masana'antar semiconduttor

Baya ga gas na gargajiya da aka lissafa a sama, wasu gas suna samun kulawa a tsarin masana'antar semicondurcortork, ciki har da:

Carbon dioxide (Co₂): Amfani da shi a wasu tsabtatawa da etching aikace-aikacen, musamman waɗanda suka shafi kayan ci gaba.

Silicon Dioxide (Sio₂): Kodayake ba gas ba ne a ƙarƙashin yanayin daidaitattun yanayi, an yi amfani da siffofin silicon dioxide dioxide a wasu hanyoyin ajiya.

Muhalli na muhalli

Masana'antar SeMiconductor tana kara mayar da hankali kan rage tasirin muhalli da aka danganta da amfani da gas daban-daban, musamman wadanda wadannan abubuwan gas ne na grease. Wannan ya haifar da ci gaban tsarin sarrafa gas gas gas da gas wanda zai iya samar da irin fa'idodi iri ɗaya tare da ƙananan ƙafafun muhalli.

Ƙarshe

Man gas da aka yi amfani da shi a cikin masana'antar semicondtort suna taka muhimmiyar rawa wajen tabbatar da daidaito da ingancin ayyukan kirkira. A matsayinsa na ci gaba, masana'antar masana'antu ta ci gaba da ci gaba game da tsarkakakkiyar mai gas da gudanarwa, yayin da kuma magance aminci da damuwa da alaƙa da amfaninsu.