Masana'antar semictionectory, a matsayin ainihin ci gaban Fasaha na zamani, ya ƙunshi manyan abubuwa da yawa da kuma gas mai tsabta a cikin masana'antar masana'antu. Gases na musamman don semiconductors suna nufin gas da ke taka muhimmiyar rawa a cikin kayan aikin kayan Semiconduttoror, da EGRing, da sauran matakai. Waɗannan gas ɗin dole ne su cika bukatun tsayayyen buƙatu don tsarkaka, kwanciyar hankali, da kuma sarrafa iko akan matakan aiwatarwa. Wannan labarin zai gabatar da gas da yawa na musamman wanda aka yi amfani da su a Semicontuctor da tattauna matsayinsu a tsarin masana'antar semicondutector.

1. Hydrogen (H₂)

Hydrogen Ana amfani dashi sosai a cikin masana'antar ƙwayoyin semiconduror, musamman a ajiya ta tursasawa (CVD) da rage halayen. A cikin CVD, hydrogen yawanci gauraye da sauran gas don yin fina-finai na bakin ciki, kamar finafinan silicon. Hakanan yana amfani da hydrogen a matsayin wani yanki mai ragewa a cikin selin ƙarfe da aikin oxide. Ari ga haka, ana amfani da hydrogen a cikin tsaftacewa da kuma kula da wafers na semiconductor don cire gurbatattun abubuwa yadda ya kamata kuma inganta ingancin kwakwalwan kwamfuta.

2. Nitrogen (n₂)

Nitrogen, an yi amfani da iskar gas, musamman ana amfani dashi don samar da yanayi mai hauhawar iskar oxygen a cikin masana'antar Semiconductor. Ana amfani dashi cikin tsabtace kayan aiki, tafiyar ruwa mai sanyaya, kuma a matsayin dilubes a cikin yanayin amsawa. A cikin ajiya na tururi da etching, nitrogen ne sau da yawa hade da sauran gas don dorewa yanayin da kuma sarrafa kudin dauki. Nitrogen shima ana amfani dashi don kashe katidawa na haushi, kare kayan da ke da hankali daga lalacewar iskar shaka.

3. Oxygen (o ₂)

Oksijen Yana wasa da muhimmiyar rawa a cikin masana'antar semiconductory, musamman cikin tsarin haushi. A cikin samuwar silicon dioxide Layer a farfajiya na silicon wafers, oxygen yana da mahimmanci. Ta hanyar gabatar da iskar oxygen, kayan haɗin oxide iri-iri na silicon, wanda yake da mahimmanci don aikin lantarki da kwanciyar hankali na Na'ura. Hakanan ana amfani da oxygen a cikin tsabtatawa da etching tare da wasu gas na sunadarai don samar da etxides ko cire wasu fina-finai na ƙarfe.

4. Carbon Tetrafluhlide (Cf₄)

Carbon tetraflafile ana amfani dashi sosai a cikin ayyukan etching. A cikin semiconductort etching, cf₄ an gauraye da sauran gas na bakin ciki don cire fina-finai da kyau sosai, karfe, da sauran kayan. Lokacin da Cf₄ ya haɗu tare da fuka-fukai, yana siffanta da ƙaruwa, wanda ke da tsayayyen lokaci kuma yana iya ingantaccen etch da kayan manufa. Wannan iskar tana da mahimmanci ga babban abin da etching etching a cikin hade da aka haɗa.

5. Hydrogen chloride (HCL)

Hydrogen gas na gas da farko ana amfani dashi azaman iskar gas, musamman a cikin etching na kayan ƙarfe. Yana da fina-finai na karfe don samar da chlorides, ba da izinin yadudduka na ƙarfe. Ana amfani da wannan tsari sosai a cikin tsarin fina-finai na bakin ciki, tabbatar da madaidaicin tsarin guntu.

6. Nitrogen berauroride (nf₃)

Ana amfani da tsararren nitrogen traflororde galibi don tsabtace restives a cikin kayan aikin plasma etching. A cikin matakai platma etching, Nf₃ recties tare da adana kayan (kamar silicon filayen ruwa) don samar da saukin cire daskarewa. Wannan gas ɗin yana da inganci sosai a tsarin tsabtatawa, yana taimakawa wajen kula da tsabta kayan aikin etching da inganta daidaito da ingancin masana'antu.

7. Silane (sih ₄)

Silane mai amfani ne da aka saba amfani dashi a cikin ɓoye vapor ajiye (CVD), musamman don ajiye silicon na bakin fina-finai. Silane ya bazu a yanayin zafi don samar da finafinan siliki a kan surfrate, wanda yake da mahimmanci a cikin masana'antar semiconductor. Ta hanyar daidaita kwararar Silane da yanayin amsawa, ana iya sarrafa farashin ajiya da ingancin fim.

8. Boron Triflulaurede (bf₃)

Boron Triflulauride muhimmin iskar gas ne, wanda aka saba amfani dashi a cikin tsarin Boron Doping a cikin masana'antar Semicontort. Ana amfani dashi don daidaita kaddarorin lantarki na Crystal ta mayar da Silicon Substrate don samar da Layer da ake so. Tsarin Boron Doping yana da mahimmanci don ƙirƙirar kayan P-Typonductor P-Typent Seeticonductor, da Bf₃ Gas yana taka muhimmiyar rawa a cikin wannan tsari.

9. Sulfur hexafluoride (sf₆)

Sulfur hexaflumide ana amfani da shi akasari a cikin matakan eticonductortort, musamman a babban daidaitawa. Saboda babban kaddarorin insulting kaddarorin da aka kiyaye da sauran gas ɗin da za'a iya haduwa da su daidai cire fina-finai da tabbatar da tsarin gaske. Hakanan ana amfani da shi sosai a cikin ion Eitch, yadda yakamata a cire finafinan ƙarfe mara amfani.

Ƙarshe

Gases na Gaske don semiconductors suna taka rawar gani a cikin masana'antar da'irori. Yayinda fasahar take ci gaba da ci gaba, bukatar samar da wadataccen tsattsauran da aikin masu gas ya kara inganta ingancin ingancinsu koyaushe. A nan gaba, masana'antar semiconductor za ta ci gaba da dogaro da wadannan gas na musamman don tallafawa samar da kwakwalwan kwakwalwan kwamfuta na gaba. Saboda haka, fahimta da kuma amfani da gas na musamman gas zai zama mai mahimmanci a cikin ci gaba da ci gaban masana'antar semicontectory.