Tare da saurin ci gaban masana'antar semiconductor na duniya, matakan kera guntu sun shiga cikin zamanin nanometer. A cikin wannan madaidaicin tsari na masana'antu, kowane juzu'in muhalli na minti daya ko ƙazanta na kayan zai iya haifar da tarwatsewar gabaɗayan wafers. Don haka, iskar gas na musamman na lantarki da iskar gas ɗin masana'antu masu tsabta suna taka rawar da ba za a iya maye gurbinsu ba. Daga cikin su. high tsarki ruwa argon ya zama mabuɗin mabuɗin da za a iya amfani da shi a cikin ayyukan yau da kullun na masana'antar semiconductor saboda ƙarancin ƙarancinsa na sinadarai da kyawawan kaddarorin jiki.

Wannan labarin zai yi nazari sosai kan ainihin aikace-aikacen argon na ruwa a cikin ayyukan masana'antar guntu da samar da jagorar siye na ƙwararrun ƙungiyoyin sarkar samar da kasuwanci.

Babban Aikace-aikacen: Me yasa Liquid Argon ba ya rabuwa da masana'antar Semiconductor?

A cikin tsarin masana'antu na gaba-Ƙarshen-Layi (FEOL), argon ruwa don semiconductor ana amfani da shi da farko a cikin mahimman matakai masu zuwa waɗanda ke ƙayyadaddun ƙimar samfur:

• Zubar da Turin Jiki (PVD) / Faɗawa: Gas ɗin argon mai tsafta, wanda aka kafa ta gasification na argon ruwa, shine mafi yawan iskar gas mai aiki a cikin hanyoyin sputtering PVD. A cikin ɗaki, ions argon suna haɓaka ta hanyar wutar lantarki don jefa bama-bamai akan abin da aka nufa, yana haifar da atom ɗin da aka yi niyya don wargajewa da ajiyewa daidai gwargwado a saman wafer don samar da fim ɗin ƙarfe. Babban tsabta shine abin da ake bukata don tabbatar da yawa da daidaiton lantarki na fim din.
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• Cikakken Amintaccen Yanayin Kariyar Inert: Yayin da ake ja da silikon monocrystalline (kamar tsarin Czochralski) da kuma yanayin zafi mai zafi, silicon yana saurin amsawa tare da iskar oxygen a yanayin zafi. Sabili da haka, dole ne a ci gaba da gabatar da iskar argon don maye gurbin iska, yana samar da yanayin da ba shi da kyau wanda ya keɓe daga iskar oxygen da danshi, don haka tabbatar da ingantaccen ci gaban siliki crystal lattice.
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• Fasahar Tsabtace Cryogenics da Wafer: A cikin ci-gaba matakai kamar Extreme Ultraviolet (EUV) lithography, da matsananci-ƙananan zafin jiki halaye na ruwa argon ( tafasar batu -186 ° C) wani lokacin amfani da sanyaya tsarin na madaidaicin kayan aiki. A lokaci guda, kuma ana amfani da fasahar aerosol na argon don tsabtace micro-clean nanometer akan filayen wafer, wanda ba zai iya kawar da ɓarna na ɗan lokaci ba.
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Ingancin Yana Ƙaddara Haɓaka: Madaidaitan Ma'auni na Babban Tsaftataccen Argon Ruwa

Bukatun masana'antar semiconductor don albarkatun ƙasa suna da tsauri na musamman. Argon ruwa na masana'antu na yau da kullun yana buƙatar isa ga tsabtar 99.9% ko 99.99%, amma wannan yayi nisa daga biyan buƙatun masana'antar guntu. Domin m high tsarki ruwa argon, ana buƙatar tsaftar tushe yawanci don isa 99.999% (5N), kuma a cikin nodes masu ci gaba, har ma yana buƙatar isa 99.9999% (6N) ko sama.

Mafi mahimmanci shine sarrafa ƙazanta. Abubuwan da ke cikin oxygen, nitrogen, danshi, jimlar hydrocarbons (THC), da ions na ƙarfe dole ne a sarrafa su sosai a matakin ppb (ɓangarorin biliyan ɗaya) ko ma ppt (ɓangarorin kowace tiriliyan). Ko da adadin najasa na minti daya ya haɗu a cikin bututun iskar gas, zai haifar da lahani a kan saman wafer, yana haifar da gajeriyar da'irar guntu ko ɗigogi na yanzu, kai tsaye yana jawo ƙimar yawan amfanin ƙasa tare da kawo asarar tattalin arziki mai yawa.

Jagoran Sayi: Yadda Ake Aunawa da Zaɓan Ma'aikacin Liquid Argon Supplier?

Ganin gagarumin rawar da iskar gas mai tsabta ke takawa wajen gudanar da ayyukan samar da layukan samarwa, ganowa da kuma tabbatar da cikakken ƙwararren mai samar da ruwa na argon babban aiki ne na ƙungiyoyin sayayya da sarƙoƙi. A lokacin da ake kimanta yuwuwar masu samar da kayayyaki, ana ba da shawarar a mai da hankali kan abubuwa uku masu zuwa:

Ƙwararren Ƙwararren Ƙwararren Ƙwararrun Ƙwararrun Ƙwararrun Ƙwararrun Ƙwararrun Ƙwararrun Ƙwararrun Ƙwararrun Ƙwararrun Ƙwararrun Ƙwararrun Ƙwararru: ƙwararrun masu siyarwa dole ne a sanye su da kayan bincike na sama-sama kamar Gas Chromatographs (GC) da Mass Spectrometers (MS). Dole ne su sami damar samar da cikakken COA (Takaddun Takaddun Bincike) ga kowane tsari don tabbatar da cikakken daidaito cikin tsarki tsakanin bayarwa.

Ƙarfafan Sarkar Kayayyakin Ƙarfafawa da Ƙarfafa Isarwa: Fabs yawanci suna aiki 24/7/365, kuma farashin lokacin ƙasa yana da girma sosai. Don haka, dole ne masu ba da kaya su mallaki manyan damar ajiyar ruwa da aka keɓe, da nasu tafsirin manyan motocin tanka na cryogenic, da cikakkun tsare-tsare na gaggawa don tabbatar da wadatar gaggawa.

Babban Kwantena da Fasaha na Anti-“Lalacewar Sakandare”: Komai girman tsaftar iskar gas, ba shi da amfani idan an gurɓace yayin sufuri. Ya kamata a mayar da hankali kan tankunan ajiya na cryogenic mai kaya da fasahar jiyya na bango na ciki (kamar ko an yi amfani da Electropolishing / EP jiyya), da kuma ka'idodin Ka'idojin Aiki (SOP) don bawul da bututun bututu yayin cikawa da matakan canja wuri, tabbatar da cewa za a iya isar da tsafta kai tsaye daga shuka zuwa tashar abokin ciniki.

Ƙarshe

A ƙarƙashin ci gaba da ci gaba na Dokar Moore, babban tsaftar ruwa argon ba kawai abin da ake amfani da shi ba ne, har ma da “rakiya da ba a iya gani” don ci gaba da tafiyar da semiconductor. A kimiyance da tsauri da kimantawa da zabar a ruwa argon mai kaya tare da cikakken ƙarfi don tabbatar da inganci da kwanciyar hankali na samar da ruwa na argon don semiconductor shine mabuɗin ginshiƙi ga kowane masana'antar masana'antar semiconductor don haɓaka yawan amfanin ƙasa da ci nasara a gasar kasuwannin duniya.