Umkhakha we-semiconductor, njengoba umnyombo wokuthuthuka kwezobuchwepheshe wanamuhla, uhilela ukunemba okuphezulu okuphezulu namagesi ahlanzekile aphezulu kwinqubo yawo yokukhiqiza. Amagesi akhethekile we-semiconductors abhekisela kumagesi adlala indima enkulu ekukhiqizeni okuqukethwe kwe-semiconductor, ukukhiqiza ama-chip, ukufakwa kwamafilimu, ukufakwa kwamafilimu, nezinye izinqubo, nezinye izinqubo. Lawa magesi kufanele ahlangabezane nezidingo eziqinile zobumsulwa, ukuqina, kanye nokulawula okuqondile ngezinqubo zokuphendula. Le ndatshana izokwethula amagesi akhethekile ajwayelekile asetshenziswa kuma-semiconductor futhi axoxe ngezindima zawo enqubeni yokukhiqiza i-semiconductor.

1. I-Hydrogen (H₂)

I-hydrogen isetshenziswa kabanzi ekukhiqizeni kwe-semiconductor, ikakhulukazi ku-Chemical Vapor Deposition (CVD) kanye nokuncipha kokuphendula. Ku-CVD, i-hydrogen ivame ukuhlanganiswa namanye amagesi ukukhulisa amafilimu amancanyana, njengamafilimu e-silicon. I-Hydrogen ibuye isebenze njenge-ejenti enciphisa ezinqubweni zokususa zensimbi kanye ne-oxide yokususa. Ngokwengeziwe, i-hydrogen isetshenziswa ekuhlanzeni nasekwelapheni ama-semiconductor we-wafers ukuze asuse ngempumelelo ukungcola komhlaba futhi athuthukise ikhwalithi yama-chip.

2. Nitrogen (n₂)

Nitrogen, igesi i-inert, isetshenziselwa ikakhulukazi ukuhlinzeka ngemvelo engenawo umoya-mpilo ekukhiqizweni kwemithi ye-semiconductor. Isetshenziswa kakhulu ekuhlanzeni imishini, izinqubo zokupholisa, kanye ne-dilossees ephendulayo. In izinqubo ze-Vapor Desevise kanye ne-Etching izinqubo, i-nitrogen imvamisa ihlanganiswa namanye amagesi ukuzenzisa izimo zokuphendula nokulawula isilinganiso sokuphendula. I-nitrogen nayo isetshenziselwa ukucindezela i-oxidation, ukuvikela izinto ezibucayi kusuka kumonakalo we-oxidation.

3. Umoya-mpilo (O₂)

Umoya ohlanzekile Idlala indima ebalulekile embonini ye-semiconductor, ikakhulukazi ezinqubweni ze-oxidation. Ekwakhekeni kwesendlalelo se-silicon dioxide ngaphezulu kwe-silicon wafers, umoya-mpilo ubalulekile. Ngokwethula i-oksijini, amafomu ongqimba ojwayelekile we-oxifomu oxide e-silicon, okubalulekile ekusebenzeni kukagesi nokuqina kwensiza. I-oksijini ibuye isetshenziselwe izinqubo zokuhlanza kanye nokuhlanza izinqubo, ukuphendula namanye amakhemikhali amakhemikhali ukwenza ama-oxides noma asuse amafilimu athile wensimbi.

4. I-Carbon Tetrafluoride (CF₄)

I-Carbon Tetrafluoride isetshenziswa kabanzi kwizinqubo ze-etching. E-semiconductor etching, i-CF₄ ihlanganiswa namanye amagesi ukususa ngempumelelo amafilimu amancanyana eSilico, i-silicon nitride, insimbi nezinye izinto. Lapho i-CF₄ ihlanganisa nge-fluorine, yakha ama-fluorides, anobuhlakani obuqinile futhi angathola kahle izinto eziqondiwe. Le gesi ibalulekile ukuthola iphethini enokunemba ephezulu ekukhiqizeni okuhlangene kwesifunda.

5. IHydrogen Chloride (HLC)

I-hydrogen chloride gesi isetshenziswa ngokuyinhloko njengegesi e-etching, ikakhulukazi e-etching yezinto zensimbi. Iphendula ngamafilimu wensimbi ukwakha ama-chlorides, avumele izingqimba zensimbi zisuswe. Le nqubo isetshenziswa kabanzi ekulandeleleni amafilimu wensimbi amancanyana, ukuqinisekisa ukunemba kwezakhiwo ze-chip.

6. I-Nitrogen Trifluoride (NF₃)

I-Nitrogen Trifluoride isetshenziselwa ikakhulukazi ukugeza izinsalela kwemishini yokufaka i-plasma etching. Ezinhlelweni ze-plasma etching, i-NF₃ iphendula ngezinto zokwakha ezifakiwe (njengama-silicon fluorides) ukwakha ama-fluorides asuswa kalula. Le gesi isebenza kahle kakhulu kwinqubo yokuhlanza, isiza ukugcina inhlanzeko yemishini yokufaka futhi ithuthukise ukunemba nokusebenza kwezindlela zokukhiqiza.

7. USilane (Sih₄)

USilane uyigesi esetshenziswa kaningi ku-Chemical Vapor Deposition (CVD), ikakhulukazi ngokufaka amafilimu amancanyana e-silicon. USilane ubolile emazingeni okushisa aphezulu ukwakha amafilimu e-silicon endaweni engaphezulu komhlaba, ebaluleke kakhulu ekukhiqizweni kwemithimonductor. Ngokushintsha ukugeleza kwezimo ze-reene and reaction, isilinganiso sokubekwa kanye nekhwalithi yefilimu kungaba elawulwa ngokunembile.

8. I-Boron Trifluoride (BF₃)

I-Boron Trifluoride igesi ebalulekile ye-doping, esetshenziswa ngokujwayelekile kwinqubo ye-boron doping ekukhiqizweni kwe-semiconductor. Isetshenziselwa ukulungisa izakhiwo zikagesi zekristalu ngokuphendula nge-silicon substrate ukwakha ungqimba olufunayo lwe-doping. Inqubo ye-boron doping ibalulekile ekwakheni izinto zohlobo lwe-semiconductor, kanye negesi ye-BF₃ kudlala indima ebalulekile kule nqubo.

9. Sulfir hexafluoride (sf₆)

Sulfir hexafluoride Isetshenziswa kakhulu ezinhlelweni zokufaka i-semiconductor, ikakhulukazi ekukhetheni kahle okuphezulu. Ngenxa yezakhiwo zayo eziphezulu zikagesi ezifaka amandla kanye nokuqina kwamakhemikhali, i-SF₆ ingahlanganiswa namanye amagesi ukususa ngokunembile amafilimu ezibonakalayo futhi uqinisekise amaphethini aqondile. Iphinde isetshenziswe kabanzi e-Ion etching, isusa kahle amafilimu wensimbi angafuneki.

Ukugcina

Amagesi akhethekile e-semiconductors adlala indima engenakuphikwa ekwenziweni kwemibukela ehlanganisiwe. Njengoba ubuchwepheshe buqhubeka buqhubekisela phambili, isidingo sokuhlanzeka okuphezulu nokusebenza kwalawa magesi siyakhuphuka, okushukumisela abahlinzeki ukuthi basebenzise kahle ikhwalithi nezinhlobo zamagesi. Esikhathini esizayo, imboni ye-semiconductor izoqhubeka nokuthembela kulezi zinto ezikhethekile ukusekela ukukhiqizwa kwezinto ezisheshayo kanye nobuchwepheshe obusha. Ngakho-ke, ukuqonda nokusebenzisa amagesi ama-semiconductor akhethekile kuzobaluleka ekushayeleni ukuthuthukiswa okuqhubekayo komkhakha we-semiconductor.