2. Hobaneng ha Indasteri ea Semiconductor e Batla Bohloeki bo Felletseng

Ho utloisisa tlhokahalo ea bohloeki bo phahameng haholo, motho o tlameha ho utloisisa boholo ba tlhahiso ea semiconductor ea sejoale-joale. Li-chips tsa kajeno tse tsoetseng pele haholo li na le li-transistor tse bophara ba li-nanometer tse 'maloa feela. Ho hlakisa taba ena, khoele e le ’ngoe ea moriri oa motho e ka ba li-nanometer tse ka bang 80 000 ho ea ho tse 100 000.

Ha u ntse u haha ​​mehaho boemong ba athomo, molek'hule e le 'ngoe ea oksijene kapa lerotholi le lenyenyane la metsi le ka baka ho hlōleha ho tšabehang.

• Oxidation: Oksijene e sa batleheng e ka sebetsana le meaho e bobebe ea silicon, ea fetola thepa ea eona ea motlakase.

• Particulate Silafatsoa: Esita le karoloana e le 'ngoe e khelohileng e ka khutsufatsa nanoscale transistor, ea etsa hore karolo eohle ea microchip e se ke ea sebetsa.

• Phokotso ea Kotulo: Ka lesela le sebetsanang le likete tsa li-wafers ka beke, ho theoha ho fokolang ha chai ka lebaka la tšilafalo ea khase ho ka fetolela ho limilione tse mashome tsa liranta tse lahlehileng.

Ka hona, the semiconductor liquid argon e kentsoeng tikolohong ea phaposi ea bohloeki e tlameha ho se be le tšilafalo efe kapa efe e sebetsang.

3. Likopo tsa mantlha tsa Semiconductor Liquid Argon

Leeto la sephaphatha sa silicon ho tloha linthong tse tala ho ea ho microprocessor e felileng le nka mehato e rarahaneng e makholo. Ultra-high purity liquid argon e kopantsoe ka botebo likarolong tse 'maloa tsa bohlokoa ka ho fetisisa tsa leeto lena.

3.1. Silicon Crystal Pulling (Ts'ebetso ea Czochralski)

Motheo oa microchip leha e le efe ke sephaphatha sa silicon. Li-wafers tsena li tšeloa ho tloha ho li-ingots tse kholo, tse nang le kristale e le 'ngoe ea silicon e hōlileng ka mokhoa oa Czochralski (CZ). Ts'ebetsong ena, silicon e hloekisitsoeng haholo ea polycrystalline e qhibilihisoa ka har'a quartz crucible ka mocheso o fetang 1,400 ° C. Ho hlahisoa kristale ea peo 'me butle-butle e huleloa holimo, e hula kristale e phethahetseng ea cylindrical ho tsoa ho qhibiliha.

Nakong ea ts'ebetso ena e feteletseng ea mocheso, silicon e qhibilihisitsoeng e sebetsa haholo. Haeba e kopana le oksijene kapa naetrojene, e tla etsa silicon dioxide kapa silicon nitride, e senya sebopeho se hloekileng sa kristale. Mona, argon e sebetsa e le mosireletsi ea ka sehloohong. Sebōpi se lula se hloekisoa ka mouoane ultra-high purity liquid argon ho bopa moya o sa tsitsang ka botlalo. Hobane argon e boima ho feta moea, e etsa kobo e sireletsang holim'a silicon e entsoeng ka ho qhibilihisoa, ho etsa bonnete ba hore ingot e hlahisoang e nepahetse ebile ha e na likoli tse nyane.

3.2. Ho tšeloa ha Plasma le ho Eketsoa

Li-chips tsa sejoale-joale li hahiloe ka mekhahlelo ea 3D. Sena se kenyelletsa ho beha likaroloana tse nyane haholo tsa lisebelisoa tsa conductive kapa tse sireletsang holim'a sephutheloana ebe o phunya likarolo tse itseng ho etsa li-circuits.

• Sputtering (Deposition Physical Vapor – PVD): Argon ke khase e ka sehloohong e sebelisoang ho fafatsa. Ka kamoreng ea vacuum, khase ea argon e kenngoa ka plasma. Li-ion tsena tsa argon tse chehiloeng hantle li potlakisoa hore e be ntho e shebiloeng (joalo ka koporo kapa titanium). Matla a matla a kinetic a li-ion tse boima tsa argon a hula liathomo ho tloha moo ho shebiloeng, ebe li beha ka ho lekana holim'a sephaphatha sa silicon. Argon e khethiloe hobane boima ba eona ba athomo bo loketse hantle ho ntša liathomo tsa tšepe hantle ntle le ho sebetsana le tsona ka lik'hemik'hale.

• Deep Reactive Ion Etching (DRIE): Ha bahlahisi ba hloka ho kenya liforo tse tebileng, tse nepahetseng haholo ka har'a silicon-e bohlokoa bakeng sa li-memory chips le liphutheloana tse tsoetseng pele-argon hangata e tsoakoa le likhase tse sebetsang ho tsitsisa plasma le ho thusa ho otla bokaholimo, ho fiela lihlahisoa tse hahelletsoeng.

3.3. DUV le EUV Lithography (Excimer Lasers)

Lithography ke mokhoa oa ho sebelisa leseli ho hatisa lipaterone tsa potoloho holim'a sephaphatha. Ha lipotoloho li ntse li fokotseha, bahlahisi ba ile ba tlameha ho sebelisa leseli le nang le maqhubu a makhutšoane a ntseng a eketseha. Ke hona moo metsi argon elektronike kopana le fisiks ea optical.

Deep Ultraviolet (DUV) lithography e itšetlehile haholo ka li-excimer lasers tsa ArF (Argon Fluoride). Li-laser tsena li sebelisa motsoako o laoloang ka nepo oa argon, fluorine, le likhase tsa neon ho hlahisa khanya e tsepamisitsoeng haholo ka bolelele ba maqhubu a 193 nanometer. Bohloeki ba argon bo sebelisitsoeng mekoting ena ea laser bo thata ka mokhoa o makatsang. Litšila leha e le life li ka theola laser optics, tsa fokotsa matla a leseli, 'me tsa etsa hore mokhoa oa lithography o hatise li-circuits tse lerootho kapa tse nang le phoso.

Esita le litsamaisong tse ncha tsa Extreme Ultraviolet (EUV) lithography, argon e bapala karolo ea bohlokoa joalo ka khase ea ho hloekisa ho boloka liipone tse bonojoana, tse rarahaneng haholo li se na tšilafalo ea limolek'hule.

3.4. Annealing le Thermal Processing

Ka mor'a hore li-dopants (joaloka boron kapa phosphorus) li kenngoe ka har'a silicon ho fetola thepa ea eona ea motlakase, sephaphatha se tlameha ho futhumatsoa ho fihlela mocheso o phahameng ho lokisa tšenyo ea lesela la kristale le ho kenya li-dopants. Ts'ebetso ena, e tsejoang ka hore ke annealing, e tlameha ho etsahala sebakeng se laoloang ka thata, se se nang oksijene ho thibela bokaholimo ba sephaphatha hore bo se ke ba tsoa oxidizing. Phallo e tsoelang pele ea ultra-pure argon e fana ka tikoloho ena e sireletsehileng ea mocheso.

4. Liquid Argon Electronics: Ho matlafatsa Moloko o latelang oa Tech

Kotara metsi argon elektronike ka bophara e akaretsa tikoloho ea lisebelisoa tsa theknoloji e phahameng le mekhoa ea tlhahiso e itšetlehileng ka thepa ena ea cryogenic. Ha re ntse re kena mehleng e laoloang ke Artificial Intelligence (AI), Internet of Things (IoT), le likoloi tse ikemetseng, tlhokahalo ea li-chips tse matla le tse sebetsang hantle e ntse e phahama.

1. AI Accelerators le GPUs: Likarolo tse kholo tsa graphical processing units (GPUs) tse hlokehang ho koetlisa mefuta ea AI joalo ka mefuta e meholo ea lipuo li hloka silicon e kholo haholo, e se nang sekoli e shoa. Ha lefu le le leholo, ho na le monyetla o moholo oa hore litšila tse le 'ngoe li ka senya chip kaofela. Tikoloho e se nang sekoli e fanoeng ke UHP argon ha e ka buisanoa mona.

2. Quantum Computing: Ha bafuputsi ba ntse ba nts'etsapele likhomphutha tsa quantum, lisebelisoa tsa superconducting tse sebelisoang ho theha li-qubits li hloka tikoloho ea tlhahiso e nang le tšilafalo e haufi le zero. Argon purging ke ea bohlokoa ho lokiseng li-cryogenic le ho etsoa ha li-processor tsena tsa moloko o latelang.

3. Motlakase oa Motlakase: Likoloi tsa motlakase li itšetlehile ka lisebelisoa tsa matla tsa Silicon Carbide (SiC) le Gallium Nitride (GaN). Ho holisa likristale tsena tsa semiconductor ho hloka mocheso o phahameng ho feta silicon e tloaelehileng, ho etsa hore thepa e sireletsang ea argon e be ea bohlokoa le ho feta.

5. Bohlokoa ba Ketane ea Thepa le Ho Fumana

Ho hlahisa ultra-high purity liquid argon ke mohlolo oa boenjiniere ba lik'hemik'hale ba kajeno. Hangata e ntšoa moeeng ho sebelisoa cryogenic fractional distillation in massive air separation units (ASUs). Leha ho le joalo, ho hlahisa khase ke halofo feela ea ntoa; ho e isa ho sesebelisoa sa semiconductor ntle le ho lahleheloa ke bohloeki ke phephetso e tšoanang.

Taolo ea Tšilafalo Nakong ea Lipalangoang

Belofo e 'ngoe le e 'ngoe, phala, le tanka ea polokelo e amang ultra-high purity liquid argon e tlameha ho hloekisoa ka ho khetheha ka motlakase le ho hloekisoa pele. Haeba tanka ea lipalangoang e na le ho lutla ha microscopic, khatello ea sepakapaka e ke ke ea tlohella argon feela; mocheso oa cryogenic o hlile o ka hula litšila tsa sepakapaka ho, ho senya sehlopha sohle.

Boemong ba masela, argon ea mokelikeli e bolokoa ka litankang tse kholo tsa vacuum-insulated bulk. E ntan'o fetisoa ka li-vaporizer tse khethehileng haholo le lisebelisoa tse hloekisang khase pele li kena ka phaposing e hloekisang.

Ho boloka tlhahiso e tsoelang pele, e sa sitisoeng, bahlahisi ba li-semiconductor ba tlameha ho sebelisana le barekisi ba khase ba maemo a holimo ba ipabolang ka mokhoa ona oa phepelo o matla. Bakeng sa meaho ea morao-rao e batlang ho boloka phepelo e tsoelang pele, e tšepahalang ea thepa ena ea bohlokoa e nang le metrics e netefalitsoeng ea bohloeki, ho hlahloba litharollo tse khethehileng tsa khase ea indasteri ho tsoa ho bafani ba tšepahalang joalo ka Huazhong Khase e etsa bonnete ba hore litekanyetso tse nepahetseng lia finyelloa 'me nako ea tlhahiso ea tlhahiso e felisoa.

6. Maikutlo a Moruo le Tikoloho

Bophahamo bo bongata ba argon bo jeoang ke gigafab ea sejoale-joale boa makatsa. Setsi se le seng se seholo sa tlhahiso ea semiconductor se ka sebelisa mashome a likete a cubic metres ea khase e hloekileng haholo letsatsi le leng le le leng.

Sustainability and Recycling

Hobane argon ke khase e ntle 'me ha e sebelisoe lik'hemik'hale mekhoeng e mengata ea semiconductor (e sebetsa haholo e le thebe ea' mele kapa plasma medium), ho na le ts'ebetso e ntseng e eketseha ka har'a indasteri bakeng sa lisebelisoa tsa ho hlaphoheloa le ho tsosolosa argon. Lisebelisoa tse tsoetseng pele li ntse li eketsa ho kenya likarolo tsa ho hlaphoheloa sebakeng se ts'oereng mosi oa argon ho tsoa liboping tse hulang ka kristale le likamore tsa ho hlatsa. Joale khase ena e hloekisoa bocha sebakeng seo. Sena ha se fokotse haholo litšenyehelo tsa ts'ebetso ea masela, empa se boetse se theola sekhahla sa khabone se amanang le ho ntša metsi le ho tsamaisa li-argon tse ncha libakeng tse telele.

7. Bokamoso ba Argon ho Advanced Node Manufacturing

Ha indasteri ea semiconductor e hatela pele ho 2nm, 14A (angstrom), le ho feta, meralo ea li-transistors e ntse e fetoha. Re tloha FinFET ho ea Gate-All-Around (GAA) mme qetellong re ea ho meralo e tlatsetsang ea FET (CFET).

Mehaho ena ea 3D e hloka deposition ea atomic layer (ALD) le atomic layer etching (ALE) -mekhoa e laolang silicon ka ho toba athomo e le 'ngoe ka nako. Ho ALD le ALE, li-pulses tse laoloang ka nepo tsa argon li sebelisoa ho hloekisa kamore ea karabelo lipakeng tsa litekanyetso tsa lik'hemik'hale, ho netefatsa hore karabelo e etsahala feela moo e reretsoeng holim'a athomo.

Ha ho nepahala ho ntse ho eketseha, ho itšetleha ka semiconductor liquid argon e tla mpefala feela. Litlhoko tsa bohloeki li kanna tsa feta maemo a hajoale a 6N, ho sutumelletsa sebakeng sa 7N (99.99999%) kapa ho feta, ho tsamaisetsa boqapi bo bong ba ho hloekisa khase le mahlale a metrology.

Sephetho

Ho bonolo ho hlolloa ke microprocessor e felileng—karoloana ea silicon e nang le li-switches tse nyenyane tse libilione tse khonang ho etsa lipalo tse libilione ka motsotsoana. Leha ho le joalo, tlhōrō ena ea boenjiniere ba batho e itšetlehile ka ho feletseng ka lintho tse sa bonahaleng tse e bōpang.

Mokelikeli oa argon oa bohloeki bo phahameng haholo ha se thepa feela; ke tšiea ea motheo ea indasteri ea semiconductor. Ho tloha ho sireletsa tlhaho e qhibilihisitsoeng ea likristale tsa silicon ho thusa plasma e betlang lipotoloho tsa nanometer, argon e tiisa tikoloho e hloekileng e hlokahalang ho boloka Molao oa Moore o phela. E le meeli ea metsi argon elektronike ho holisa ho ts'ehetsa AI, komporo ea quantum, le taolo e tsoetseng pele ea matla, tlhokahalo ea mokelikeli ona o hloekileng, o sa sebetseng hantle e tla tsoela pele ho ba matla a susumetsang tsoelopele ea mahlale a lefats'e.

FAQs

Q1: Ke hobane'ng ha argon ea metsi e khethoa ho feta likhase tse ling tsa inert tse kang nitrogen kapa helium ka mekhoa e itseng ea semiconductor?

A: Le hoja naetrojene e le theko e tlaase 'me e sebelisoa haholo e le khase e akaretsang ea ho hloekisa, ha e hlile ha e kenelle mochesong o phahameng haholo; e ka itšoara ka silicon e qhibilihisitsoeng ho etsa bofokoli ba silicon nitride. Helium ha e sebetse empa e bobebe haholo ebile e theko e boima. Argon e otla "letheba le monate" - ha e kenelle ka ho feletseng esita le mochesong o feteletseng, e boima ka ho lekaneng ho koahela silicon e qhibilihisitsoeng, 'me e na le boima ba athomo bo phethahetseng ba ho ntša liathomo nakong ea ts'ebetso ea plasma sputtering ntle le ho baka liphetoho tse sa batleheng tsa lik'hemik'hale.

Q2: Li-argon tsa metsi a hloekileng tse phahameng ka ho fetisisa li isoa joang ho limela tse entsoeng ka semiconductor (masela) ntle le tšilafalo?

A: Ho boloka bohloeki nakong ea leeto ke phephetso e kholo ea lisebelisoa. UHP liquid argon e tsamaisoa ka literaka tsa litanka tse khethehileng, tse sirelelitsoeng haholo. Libaka tse ka hare tsa litanka tsena, hammoho le li-valve tsohle le li-hoses tsa ho fetisa, li entsoe ka motlakase ho fihlela seiponeng ho thibela ho tsoa le ho senya likaroloana. Pele o kenya, sistimi eohle e hlatsuoa ka thata ka vacuum. Ha e fihla lesela, khase e feta har'a lihloekisi tse sebelisang theknoloji ea getter ea lik'hemik'hale ho tlosa litšila tsa boemo ba ppt (likarolo ho trilione) pele argon e fihla sephaphatha.

Q3: Ke boemo bofe bo nepahetseng ba bohloeki bo hlokahalang bakeng sa "semiconductor liquid argon," 'me e lekanngoa joang?

A: Bakeng sa tlhahiso e tsoetseng pele ea semiconductor, bohloeki ba argon hangata bo tlameha ho ba "6N" (99.9999% pure), leha lits'ebetso tse ling tsa morao-rao li hloka 7N. Sena se bolela hore litšila tse kang oksijene, mongobo, le hydrocarbon li behetsoe karolo e le 'ngoe ho milione (ppm) kapa likarolo ho limilione tse likete (ppb). Maemo ana a litšila tse nyane a lekantsoe ka nako ea 'nete ho lesela ho sebelisoa lisebelisoa tsa tlhahlobo tse hlokolosi haholo, tse kang Cavity Ring-Down Spectroscopy (CRDS) le Gas Chromatography with mass spectrometry (GC-MS), e netefatsang taolo e tsoelang pele ea boleng.