Ụlọ ọrụ semiconductor, dị ka isi mmalite nke mmepe nkà na ụzụ ọgbara ọhụrụ, gụnyere ọtụtụ gas dị elu na nke dị ọcha na usoro mmepụta ya. Gasị pụrụ iche maka semiconductor na-ezo aka na gas ndị na-arụ ọrụ dị mkpa na mmepụta ihe semiconductor, imepụta mgbawa, ntinye ihe nkiri dị mkpa, etching na usoro ndị ọzọ. Gas ndị a ga-emezurịrị ihe ndị a chọrọ maka ịdị ọcha, nkwụsi ike na njikwa ziri ezi na usoro mmeghachi omume. Edemede a ga-ewebata ọtụtụ gas ọpụrụiche a na-eji na semiconductor wee kparịta ọrụ ha na usoro nrụpụta semiconductor.

1. Hydrogen (H₂)

Hydrogen A na-ejikarị eme ihe n'ichepụta semiconductor, ọkachasị na ntinye mmiri kemịkalụ (CVD) na mmeghachi omume mbelata. Na CVD, a na-ejikọta hydrogen na gas ndị ọzọ iji mepụta ihe nkiri dị mkpa, dị ka ihe nkiri silicon. Hydrogen na-arụkwa ọrụ dị ka onye na-ebelata ego n'ime ntinye ígwè na usoro iwepụ oxide. Na mgbakwunye, a na-eji hydrogen na-ehicha na ịgwọ wafers semiconductor iji wepụ ihe ndị na-emerụ emerụ n'elu nke ọma ma melite ogo nke ibe.

2. Nitrogen (N₂)

Nitrogen, gas inert, bụ nke a na-ejikarị na-enye ebe ikuku oxygen na-emepụta ihe na-emepụta semiconductor. A na-ejikarị ya ihicha akụrụngwa, usoro jụrụ oyi, yana dị ka ihe na-eme ihe na ikuku mmeghachi omume. N'ime ntinye nke uzuoku na usoro etching, a na-agwakọta nitrogen na gas ndị ọzọ iji mee ka ọnọdụ mmeghachi omume kwụsie ike na ịchịkwa ọnụego mmeghachi omume. A na-ejikwa Nitrogen ebelata oxidation, na-echebe ihe ndị nwere mmetụta na mmebi oxidation.

3. Oxygen (O₂)

Oxygen na-arụ ọrụ dị mkpa na ụlọ ọrụ semiconductor, ọkachasị na usoro oxidation. Na nhazi nke silicon dioxide oyi akwa n'elu silicon wafers, oxygen dị mkpa. Site na iwebata oxygen, otu oyi akwa oxide na-etolite n'elu silicon, nke dị mkpa maka ịrụ ọrụ eletrik na nkwụsi ike ngwaọrụ. A na-ejikwa oxygen na-ehicha na nhazi usoro, na-emeghachi omume na gas ndị ọzọ na-emepụta oxides ma ọ bụ wepụ ihe nkiri metal ụfọdụ.

4. Carbon tetrafluoride (CF₄)

A na-eji carbon tetrafluoride eme ihe n'ọtụtụ ebe na usoro etching. Na semiconductor etching, CF₄ na-agwakọta ya na ndị ọzọ gas na-arụ ọrụ nke ọma wepụ mkpa fim nke silicon, silicon nitride, metal, na ihe ndị ọzọ. Mgbe CF₄ na-ejikọta ya na fluorine, ọ na-etolite fluorides, nke nwere mmeghachi omume siri ike ma nwee ike ịmepụta ihe ezubere iche nke ọma. Nke a gas dị oké mkpa maka elu-nkenke ụkpụrụ etching na integrated sekit mmepụta.

5. Hydrogen chloride (HCl)

A na-eji gas hydrogen chloride mee ihe n'ụzọ bụ isi dị ka gas na-etching, karịsịa n'ime ihe ndị e ji ígwè rụọ. Ọ na-emeghachi omume na ihe nkiri ígwè iji mepụta chlorides, na-ekwe ka e wepụ ihe mkpuchi ígwè. A na-eji usoro a eme ihe n'ọtụtụ ebe na nhazi nke ihe nkiri metal dị mkpa, na-ahụ maka nhazi nke ihe mgbawa.

6. Nitrogen Trifluoride (NF₃)

A na-eji nitrogen trifluoride eme ihe nke ọma iji hichaa ihe mkpofu na akụrụngwa etching plasma. N'ime usoro etching plasma, NF₃ na-emeghachi omume na ihe echekwara (dị ka silicon fluorides) iji mepụta fluorides na-ewepụ ngwa ngwa. Nke a gas na-arụ ọrụ nke ọma na usoro nhicha, na-enyere aka ịnọgide na-adị ọcha nke etching akụrụngwa ma melite izi ezi na arụmọrụ nke usoro mmepụta ihe.

7. Silane (SiH₄)

Silane bụ gas a na-ejikarị na-etinye n'ime ikuku kemịkalụ (CVD), ọkachasị maka idobe ihe nkiri sịlịkọn dị mkpa. Silane na-emebi emebi na oke okpomọkụ iji mepụta ihe nkiri silicon n'elu ala, nke dị oke mkpa na nrụpụta semiconductor. Site n'ịgbanwe usoro silane na ọnọdụ mmeghachi omume, enwere ike ịchịkwa ọnụego nkwụnye ego na àgwà ihe nkiri nke ọma.

8. Boron Trifluoride (BF₃)

Boron trifluoride bụ gas doping dị mkpa, nke a na-ejikarị na usoro boron doping na nrụpụta semiconductor. A na-eji ya emeziwanye ihe eletriki nke kristal site n'imeghachi ya na mkpụrụ silicon iji mepụta oyi akwa doping achọrọ. Usoro doping boron dị mkpa maka ịmepụta ihe semiconductor ụdị P, na BF₃ gas na-arụ ọrụ dị oke mkpa na usoro a.

9. Sulfur Hexafluoride (SF₆)

Sulfur hexafluoride A na-ejikarị eme ihe na usoro etching semiconductor, karịsịa na etching dị elu. N'ihi nnukwu ihe mkpuchi ọkụ eletrik na nkwụsi ike kemịkalụ, SF₆ nwere ike ijikọ ya na gas ndị ọzọ iji wepu ihe nkiri ihe n'ụzọ ziri ezi ma hụ na usoro ziri ezi. A na-ejikwa ya n'ọtụtụ ebe na ion etching, na-ewepụ ihe nkiri ígwè na-achọghị nke ọma.

Mmechi

Gas pụrụ iche maka semiconductors na-arụ ọrụ na-enweghị atụ n'ichepụta sekit jikọtara ọnụ. Ka teknụzụ na-aga n'ihu na-aga n'ihu, ọchịchọ maka ịdị ọcha dị elu na ịrụ ọrụ nke gas ndị a na-abawanye, na-eme ka ndị na-ebubata ngwaahịa na-ebuli àgwà na ụdị gas mgbe niile. N'ọdịnihu, ụlọ ọrụ semiconductor ga-anọgide na-adabere na gas ndị a pụrụ iche iji kwado mmepụta nke ibe na-esote ọgbọ na nkà na ụzụ ọhụrụ. Ya mere, ịghọta na itinye gasị pụrụ iche nke semiconductor ga-adị oke mkpa n'ịkwalite mmepe nke ụlọ ọrụ semiconductor na-aga n'ihu.