Xauv lub zog ntawm Fluorine Chemistry hauv Semiconductor Manufacturing: Kev Ntsuam Xyuas Gas Tseem Ceeb

2026-01-31 IB

Lub ntiaj teb niaj hnub no khiav ntawm chips. Los ntawm lub xov tooj smartphone hauv koj lub hnab tshos mus rau cov kev taw qhia hauv aerospace engineering, me me Ntaus Ntawv Semiconductor yog tus hero unsung ntawm lub hnub nyoog digital. Tab sis dab tsi yog tus hero qab tus hero? Nws yog qhov tsis pom, feem ntau volatile ntiaj teb ntawm cov roj tshwj xeeb. Tshwj xeeb, fluorine chemistry plays lub luag haujlwm tseem ceeb hauv kev ua lag luam Kev Tsim Txaj Semiconductor txheej txheem uas tsuas yog hloov tsis tau.

Yog tias koj tab tom tswj xyuas cov saw khoom lossis saib xyuas cov khoom zoo hauv a Semiconductor foundry, koj paub tias cov npoo ntawm qhov yuam kev yog xoom. Ib qho me me ntawm cov dej noo lossis cov khoom siv me me tuaj yeem rhuav tshem ntau lab daus las ntau lawm. Kab lus no dhia tob rau hauv lub luag haujlwm ntawm muaj fluorine gases-vim li cas peb siv lawv, cov chemistry tshwj xeeb uas ua rau lawv zoo, thiab qhov tseem ceeb ntawm cov saw hlau ruaj khov thiab purity. Peb yuav tshawb xyuas cov no li cas High-Purity Gases yog siv rau hauv tus lwm yam thiab cov kauj ruam tso nyiaj, thiab yog vim li cas thiaj nrhiav tau lawv los ntawm tus khub uas ntseeg tau yog qhov kev txiav txim siab tseem ceeb tshaj plaws uas koj tuaj yeem ua rau xyoo no.

High-tech semiconductor Laboratory siv cov roj fluorine rau cov txheej txheem etching

Vim li cas kev lag luam semiconductor thiaj li nyob ntawm cov roj fluorine?

Kom nkag siab qhov Kev Lag Luam Semiconduct, koj yuav tsum tau saib ntawm lub rooj zaum. Silicon yog lub canvas, tab sis cov tshuaj fluorine yog txhuam. Cov Semiconductor Fabrication txheej txheem yuav tsim cov khaubncaws sab nraud povtseg ntawm cov ntaub ntawv thiab ces xaiv tshem tawm lawv los tsim circuits. Txoj kev tshem tawm no hu ua etching.

Cov tshuaj fluorine yog lub feem ntau electronegative keeb. Hauv cov ntsiab lus yooj yim, nws tshaib plab heev rau electrons. Thaum peb qhia fluorine gas lossis fluorinated compounds Nyob rau hauv lub plasma chamber, fluorine atoms react aggressively nrog silicon thiab silicon dioxide. Cov tshuaj tiv thaiv no hloov cov khoom silicon rau hauv cov pa tsis haum (xws li silicon tetrafluoride) uas tuaj yeem nqus tau yooj yim. Yog tsis muaj cov tshuaj reactivity no, peb tsis tuaj yeem tsim cov microscopic trenches thiab qhov sib cuag qhov xav tau rau niaj hnub Cov Khoom Siv Hluav Taws Xob.

Hauv high-volume manufacturing, ceev thiab precision yog txhua yam. Cov roj uas muaj fluorine muab qhov siab etch tus nqi uas yuav tsum tau ua kom dhau mus, thaum tseem muab cov kev xaiv los txiav los ntawm ib qho khoom tsis muaj kev puas tsuaj rau txheej hauv qab nws. Nws yog ib tug ilv balancing txoj cai ntawm chemistry thiab physics.

Dab tsi ua rau fluorine chemistry yog li tshwj xeeb rau kev ua haujlwm siab?

Tej zaum koj yuav nug, vim li cas ho tsis siv chlorine lossis bromine? Peb ua, rau tej txheej. Txawm li cas los xij, fluorine chemistry muaj qhov tshwj xeeb kom zoo dua thaum etching cov khoom siv silicon. Kev sib txuas ntawm silicon thiab fluorine yog qhov muaj zog heev. Thaum twg muaj fluorine Plasma hits lub wafer, cov tshuaj tiv thaiv yog exothermic thiab spontaneous.

Cov khawv koob tshwm sim hauv ntshav. Hauv ib Txheej txheem Semiconductor chamber, peb siv lub zog siab rau cov roj ruaj khov xws li Carbon Tetrafluoride (CF4) lossis Sulfur Hexafluoride (SF6). Qhov no rhuav tshem cov pa sib cais, tso tawm reactive cov tshuaj fluorine radicals. Cov radicals no tawm tsam qhov chaw ntawm lub wafer.

"Lub precision ntawm lub tus lwm yam txhais cov kev ua tau zoo ntawm cov nti. Yog tias koj cov roj purity hloov pauv, koj qhov etch tus nqi hloov pauv, thiab koj cov txiaj ntsig poob."

Qhov no ua rau lub tswvyim ntawm anisotropic etching-txiav ncaj nraim tsis noj sideways. Los ntawm kev sib tov cov tshuaj fluorine nrog lwm tus Kev Gases, engineers tuaj yeem tswj qhov profile ntawm trench zoo kawg nkaus. Lub peev xwm no yog qhov tseem ceeb thaum peb txav mus rau cov pob me me (7nm, 5nm, thiab hauv qab), qhov twg txawm tias tus nanometer ntawm kev sib txawv yog qhov ua tsis tiav.

Yuav ua li cas gases nyob rau hauv semiconductor manufacturing tsav advanced etch txheej txheem?

Cov txheej txheem yog cov cuab yeej sculpting fab. Muaj ob hom tseem ceeb: ntub etch (siv cov tshuaj ua kua zoo li hydrogen fluoride) thiab qhuav etch (siv plasma). Niaj hnub AdvancedRiDuctor Advancedor nodes cia siab yuav luag tsuas yog rau qhuav plasma etching vim hais tias nws yog deb npaum li cas.

Hauv ib txwm plasma etching sib, a fluorinated gas tau qhia. Cia peb saib ntau yam siv:

  • Carbon Tetrafluoride (CF4): Lub workhorse rau oxide etching.
  • Octafluorocyclobutane (C4F8): Siv los tso cov txheej txheem polymer rau ntawm phab ntsa ntawm lub trench, tiv thaiv lawv thaum lub hauv qab yog etched tob.
  • Sulfur Hexafluoride (SF6): Paub txog qhov ceev ceev silicon etching tus nqi.

Kev sib cuam tshuam ntawm cov ntshav Thiab tus substrate yog complex. Nws cuam tshuam lub cev foob pob los ntawm ions thiab tshuaj lom neeg cov tshuaj tiv thaiv los ntawm radicals. Cov semiconductor manufacturing khoom yuav tsum nruj me ntsis tswj qhov ntws, siab, thiab sib tov ntawm cov pa roj. Yog tias Cov roj txheem tshwj xeeb muaj cov impurities xws li ya raws, nws tuaj yeem tsim hydrofluoric acid nyob rau hauv cov kab xa khoom lossis lub chamber, ua rau corrosion thiab particle defects.

Kaw ntawm plasma etching chamber siv fluorine uas muaj roj

Vim li cas Nitrogen Trifluoride yog huab tais ntawm chamber tu daim ntaub ntawv?

Thaum etching thiab tu mus koom tes, ntxuav cov cuab yeej tsim khoom yog qhov tseem ceeb raws li kev ua cov wafer. Thaum Tshuaj Vauv Vacor Deposition (CVD), cov ntaub ntawv zoo li silicon los yog tungsten yog tso rau hauv wafer. Txawm li cas los xij, cov ntaub ntawv no tseem npog cov phab ntsa ntawm lub chamber. Yog hais tias qhov seem no tsim, nws flakes tawm thiab ntog mus rau lub wafers, ua rau defects.

Nkag mus Nitrogen Trifluoride (NF3).

Ntau xyoo dhau los, kev lag luam siv fluorinated tsev cog khoom gases zoo li C2F6 rau chamber tu. Txawm li cas los xij, NF3 tau dhau los ua tus qauv rau cov txheej txheem ntxuav chamber vim nws high efficiency. Thaum tawg nyob rau hauv tej thaj chaw deb plasma qhov chaw, NF3 generates ib tug loj npaum li cas ntawm fluorine atoms. Cov atoms txhuam cov phab ntsa hauv chamber kom huv si, tig cov khoom seem rau hauv cov pa uas tau tso tawm.

Nitrogen trifluoride yog qhov nyiam vim tias nws muaj kev siv ntau dua (ntau dua ntawm cov roj siv tiag tiag) thiab qis qis dua piv rau cov laus tshuaj ntxuav tes. Rau tus thawj tswj hwm qhov chaw, qhov no txhais tau tias tsis muaj sijhawm poob qis rau kev saib xyuas thiab nrawm dua.

Cov tshuaj fluorinated twg yog qhov tseem ceeb rau kev tsim khoom ntim ntau?

Tus semiconductor khoom saw cia siab rau ib lub pob tawb tshwj xeeb fluorine-muaj roj. Txhua tus muaj ib qho "daim ntawv qhia" lossis daim ntawv thov. Ntawm Jiangsu Huazhong Gas, peb pom qhov kev thov loj heev rau cov hauv qab no:

Gas npe Formula Daim ntawv thov tseem ceeb Ntsiab Feature
Cov pa roj carbon tetrafluoride CF 4 Oxide Etch Ntau yam, kev lag luam tus qauv.
Sulphur Hexafluoride SF6 Silicon Etch High etch tus nqi, siab ceev.
Nitrogen trifluoride Nf3 Chav tsev tu High efficiency, qis emission.
Octafluorocyclobutane C4F 8 Dielectric Etch Polymerizing roj rau kev tiv thaiv phab ntsa.
Hexafluoroethane C2F6 Oxide Etch / Ntxuav Legacy gas, tseem siv dav.

Tej no fluorinated compounds yog cov hlab ntsha ntawm high-volume manufacturing. Yog tsis muaj ib tug tsis tu ncua ntawm cov no gases nyob rau hauv semiconductor ntau lawm, cov kab nres. Nws yog qhov yooj yim. Qhov no yog vim li cas cov thawj tswj kev yuav khoom zoo li Eric Miller tau saib xyuas tas li Kev muab saw hlau rau kev cuam tshuam.

Vim li cas high-purity gases lub caj qaum ntawm semiconductor tawm los?

Kuv tsis tuaj yeem ntxhov siab qhov no txaus: Purity yog txhua yam.

Thaum peb tham txog High-Purity Gases, peb tsis tau tham txog "qib kev lag luam" siv rau vuam. Peb tab tom tham txog 5N (99.999%) lossis 6N (99.9999%) purity.

Vim li cas? Vim a Ntaus Ntawv Semiconductor Nws muaj cov yam ntxwv ntsuas hauv nanometers. Ib qho molecule ntawm cov hlau impurity los yog ib qho kab ntawm noo noo (H2O) tuaj yeem ua rau luv luv los yog tiv thaiv ib txheej ntawm adhering.

  • Moisture: Reacts nrog cov tshuaj fluorine los tsim HF, uas corrodes lub gas xa system.
  • Oxygen: Oxidizes silicon uncontrollably.
  • Heavy Hlau: Ua kom puas cov khoom hluav taws xob ntawm lub transistor.

Raws li tus neeg muag khoom, peb txoj haujlwm yog los xyuas kom meej tias cov high-purity xenon lossis Electronic Qib Nitrous Oxide koj tau txais raws li nruj Cov Qauv Kev Lag Luam. Peb siv cov roj chromatography siab heev los kuaj xyuas trace impurities nqes mus rau seem ib billion (ppb). Rau tus neeg yuav khoom, pom Daim Ntawv Pov Thawj Kev Ntsuam Xyuas (COA) tsis yog cov ntaub ntawv nkaus xwb; nws yog qhov guarantee tias lawv Semiconductor Fabrication yuav tsis ntsib kev puas tsuaj loj yield poob.

Tus kws tshawb fawb soj ntsuam high-purity semiconductor gases hauv chav kuaj

Kev lag luam tswj hwm lub tsev cog khoom roj emissions thiab GWP li cas?

Muaj ib tug ntxhw nyob hauv chav tsev: ib puag ncig. Ntau fluorinated gases muaj siab Ntiaj Teb Warming Potential (GWP). Piv txwv li, Sulphur Hexafluoride (SF6) yog ib qho ntawm feem ntau muaj zog tsev cog khoom gases paub rau txiv neej, nrog GWP ntau txhiab zaus siab dua CO2.

Tus semiconductor manufacturing kev lag luam yog nyob rau hauv siab loj heev los txo nws cov pa roj carbon hneev taw. Qhov no tau ua rau ob qho kev hloov pauv loj:

  1. Kev txo qis: Fabs tab tom txhim kho loj "hluav taws kub thawv" los yog scrubbers ntawm lawv cov kab tso pa. Cov tshuab no rhuav tshem cov tsis muaj kev cuam tshuam Tsev Cog Khoom Roj ua ntej nws tso rau hauv qhov chaw.
  2. Hloov pauv: Cov kws tshawb fawb tab tom nrhiav lwm txoj hauv kev tus lwm yam gases nrog qis GWP. Txawm li cas los xij, nrhiav cov molecule uas ua tau zoo li C4F8 lossis SF6 yam tsis muaj kev cuam tshuam ib puag ncig yog tshuaj lom neeg nyuaj.

Nitrogen trifluoride yog ib kauj ruam nyob rau hauv txoj cai rau kev tu vim hais tias nws tawg yooj yim dua li cov laus PFCs, ua rau tsis tshua muaj tag nrho. tso pa tawm yog tias abatement systems ua haujlwm raug. Txo Tsev cog khoom roj emissions tsis yog ib qho PR txav lawm xwb; nws yog ib qho kev cai lij choj hauv EU thiab Asmeskas.

Puas yog cov khoom siv hluav taws xob semiconductor muaj kev cuam tshuam rau cov roj tshwj xeeb tsis txaus?

Yog tias ob peb xyoos dhau los tau qhia peb ib yam dab tsi, nws yog qhov Kev muab saw hlau yog fragile. Semiconductor manufacturers tau ntsib kev tsis txaus ntawm txhua yam ntawm neon mus rau fluoropolymers.

Cov khoom siv ntawm fluorine gas thiab nws cov derivatives nyob ntawm qhov mining ntawm fluorspar (calcium fluoride). Tuam Tshoj yog lub ntiaj teb loj qhov chaw ntawm cov khoom siv raw no. Thaum geopolitical tensions nce los yog logistics txoj kev kaw, qhov muaj ntawm cov tseem ceeb Kev Gases poob, thiab tus nqi skyrocket.

Rau ib tus neeg yuav khoom zoo li Eric, kev ntshai ntawm "Force Majeure" yog tiag tiag. Txhawm rau txo qhov no, cov tuam txhab paub txog kev sib txawv ntawm lawv cov neeg xa khoom. Lawv tab tom nrhiav rau cov neeg koom tes uas muaj lawv tus kheej iso-tanks thiab tau tsim logistics networks. Kev ntseeg tau hauv Logistics tsuas yog ib qho tseem ceeb raws li qhov purity ntawm cov pa. Koj tuaj yeem muaj qhov purest c4f8 ua nyob rau hauv lub ntiaj teb no, tab sis yog tias nws daig ntawm qhov chaw nres nkoj, nws tsis muaj txiaj ntsig rau qhov fab.

Dab tsi yog cov txheej txheem kev nyab xeeb rau kev tuav Hydrogen Fluoride thiab lwm yam khoom siv tshuaj lom?

Kev nyab xeeb yog lub hauv paus ntawm peb txoj kev lag luam. Ntau muaj fluorine gases yog tshuaj lom, asphyxiants, los yog reactive heev. Hydrogen Fluoride (HF), feem ntau siv rau hauv ntub etch los yog generated raws li ib tug byproduct, tshwj xeeb tshaj yog txaus ntshai. Nws nkag mus rau ntawm daim tawv nqaij thiab tawm tsam cov pob txha.

Kev tuav cov ntaub ntawv no yuav tsum muaj kev cob qhia nruj thiab cov cuab yeej tshwj xeeb.

  • Thooj voos kheej kheej: Yuav tsum tau DOT / ISO ntawv pov thawj thiab tsis tu ncua tshuaj xyuas rau sab hauv corrosion.
  • Valves: Diaphragm li qub yog siv los tiv thaiv kom tsis txhob tawm.
  • Sensors: Semiconductor fab muaj nyob rau hauv gas detection sensors uas ua rau lub tswb thaum lub slightest to.

Thaum peb sau ib lub tog raj kheej nrog Electronic Qib Nitrous Oxide los yog tshuaj lom etchant, peb kho nws zoo li ib rab phom loaded. Peb xyuas kom meej tias lub tog raj kheej yog polished sab hauv los tiv thaiv cov khoom seem thiab tias lub valve yog capped thiab kaw. Rau peb cov neeg muas zaub, paub tias cov Tus cab kuj roj los yog etchant tuaj txog hauv kev nyab xeeb, raws li kev ntim khoom yog ib qho kev pab loj.

Kev tshuaj xyuas kev nyab xeeb ntawm seamless steel gas cylinders rau kev lag luam semiconductor

Dab tsi yog qhov ua ntej rau cov khoom siv hauv cov txheej txheem semiconductor fabrication?

Tus Semiconductor Ntau Lawm Roadmap yog txhoj puab heev. Raws li cov chips txav mus rau 3D qauv zoo li Gate-All-Around (GAA) transistors, qhov nyuaj ntawm etching thiab tu nce. Peb tab tom pom ib qho kev thov rau ntau kab txawv fluorinated gas sib tov uas tuaj yeem etch tob, nqaim qhov nrog atomic precision.

Atomic Layer Etching (ALE) yog cov txheej txheem tawm tshiab uas tshem tawm cov khoom ib txheej atomic ib zaug. Qhov no yuav tsum tau incredibly meej dosing ntawm reactive gases. Tsis tas li ntawd, kev thawb rau "ntsuab" kev tsim khoom yuav ua rau muaj kev hloov pauv tshiab fluorine chemistry uas muaj qhov ua tau zoo ib yam nrog qis dua GWP.

Lub neej yav tom ntej belongs rau cov neeg uas muaj peev xwm innovate nyob rau hauv ob qho tib si roj synthesis thiab purification. Raws li Khoom siv tshuab saciconductor evolve, cov roj siv los tsim lawv yuav tsum tau hloov zuj zus.

Futuristic semiconductor wafer fabrication nrog cov ntaub ntawv siab heev

Tseem Ceeb Takaways

  • Fluorine yog qhov tseem ceeb: Fluorine chemistry yog tus yuam sij enabler rau tus lwm yam thiab huv si kauj ruam hauv Kev Tsim Txaj Semiconductor.
  • Purity yog huab tais: High-purity (6N) tsis tuaj yeem sib tham los tiv thaiv qhov tsis xws luag thiab xyuas kom meej txheej txheem stability.
  • Ntau yam ntawm Gases: Cov roj sib txawv xws li CF4, SF6, thiab Nitrogen trifluoride ua haujlwm tshwj xeeb hauv kev yuav.
  • Environmental Impact: Tswj Tsev cog khoom roj emissions thiab txo qis yog ib qho kev sib tw tseem ceeb hauv kev lag luam.
  • Kev ruaj ntseg khoom siv: Ib tug muaj zog Kev muab saw hlau thiab cov neeg koom tes txhim khu kev qha yog tsim nyog kom tsis txhob muaj cov khoom lag luam nres.

Ntawm Jiangsu Huazhong Gas, peb nkag siab cov kev cov nyom no vim peb ua neej nyob txhua hnub. Txawm koj xav tau High Purity xenon rau koj cov txheej txheem etch tshiab tshaj plaws lossis txhim khu kev xa khoom ntawm cov qauv kev lag luam gases, peb nyob ntawm no los txhawb cov thev naus laus zis uas tsim lub neej yav tom ntej.