Wehe i ka Mana o Fluorine Chemistry ma Semiconductor Manufacturing: He Koʻikoʻi Gas Analysis

2026-01-31

Ke holo nei ka honua hou ma luna o nā chips. Mai ke kelepona i loko o kāu ʻeke a hiki i nā ʻōnaehana alakaʻi i ka ʻenekinia aerospace, ka liʻiliʻi ʻO ka polokalamu Semicondutory ʻo ia ka meʻe kaulana ʻole o ke au kikohoʻe. Akā, he aha ka meʻe ma hope o ka meʻe? ʻO ia ka honua i ʻike ʻole ʻia, maʻamau pinepine o nā kinoea kūikawā. ʻOiaʻiʻo, kemika fluorine hana nui i ka ʻO ka hana semiconductor kaʻina hana hiki ʻole ke hoʻololi.

Inā ʻoe e hoʻokele nei i kahi kaulahao hoʻolako a nānā ʻana paha i ka maikaʻi o ka huahana ma a semiconduc pā foundry, ua ʻike ʻoe he zero ka palena no ka hewa. Hiki ke hoʻopōʻino i ka holo ʻana o ka hana ʻana i ka nui miliona miliona o ka spike hoʻokahi. Luʻu hohonu kēia ʻatikala i ke kuleana o i loko o ka fluorine nā kinoea—no ke aha mākou e hoʻohana ai ia mau mea, ka kemika kikoʻī e hoʻokō pono ai, a me ke koʻikoʻi koʻikoʻi o ke kūpaʻa a me ka maʻemaʻe. E ʻimi mākou pehea kēia mau mea ʻO nā mīkini kiʻekiʻe kiʻekiʻe hoʻohana ʻia ma ettch a me nā ʻanuʻu deposition, a no ke aha ke ʻimi ʻana iā lākou mai kahi hoa hilinaʻi ʻo ia ka hoʻoholo koʻikoʻi hiki iā ʻoe ke hana i kēia makahiki.

ʻO ke keʻena hana semiconductor ʻenehana kiʻekiʻe e hoʻohana ana i ke kinoea fluorine no nā hana etching

No ke aha i hilinaʻi nui ai ka ʻoihana semiconductor i nā kinoea fluorine?

E hoomaopopo i ka Nā Hana Hana Semiconductor, pono ʻoe e nānā i ka pākaukau periodic. ʻO Silicon ka canvas, akā huhu ʻo ia ka pulupulu. ʻO ka nā mea hana semiconducor ʻO ke kaʻina hana e pili ana i ke kūkulu ʻana i nā papa o nā mea a laila e wehe pono iā lākou e hana i nā kaapuni. Kapa ʻia kēia kaʻina hana hoʻoneʻe ʻana.

Huhu ʻo ia ka mea electronegative loa. Ma nā ʻōlelo maʻalahi, pōloli loa ia i nā electrons. Ke hoʻolauna mākou kinoea fluorine Oole pūhui fluorinated i loko o ke keʻena plasma, ʻo nā ʻātoma fluorine e hana ikaika me ke silikoni a silika dioxide. Hoʻololi kēia ʻano hana kemika i ke kinoea paʻa (e like me ka silicon tetrafluoride) hiki ke hoʻokuʻu ʻia. Me ka ʻole o kēia reactivity kemika, ʻaʻole hiki iā mākou ke hana i nā ʻauwaha microscopic a me nā lua pili i koi ʻia no kēia manawa Nā Kūlana uila.

I hana nui-nuiʻO ka wikiwiki a me ka pololei nā mea a pau. Nā kinoea i loko o ka Fluorine e hāʻawi i nā kiʻekiʻe kiʻekiʻe etch e pono ai e hoʻomau i ka hoʻonui ʻana, me ka hāʻawi pū ʻana i ke koho e ʻoki i hoʻokahi mea me ka ʻole e hōʻino i ka papa ma lalo. He hana kaulike ia o kemika a me ka physics.

He aha ka mea e ʻokoʻa ai ka kemika fluorine no ka etching kiʻekiʻe?

E nīnau paha ʻoe, no ke aha e hoʻohana ʻole ai i ka chlorine a i ʻole bromine? Hana mākou, no kekahi mau papa. Eia naʻe, kemika fluorine hāʻawi i kahi pōmaikaʻi kūʻokoʻa i ka wā e hoʻopaʻa ai i nā mea pilikika. He ikaika loa ka pilina ma waena o ke silikoni a me ka fluorine. I ka manawa i loko o ka fluorine Paʻi ka plasma i ka wafer, he exothermic ka hopena a me ka manawa.

Hiki ke kilokilo i ka plasma. Ma kahi Ke kaʻina semicoronnu. keena, hoʻohana mākou i ka ikehu kiʻekiʻe i ke kinoea paʻa e like me Carbon Tetrafluoride (CF4) a i ʻole Sulfur Hexafluoride (SF6). Hoʻokaʻawale kēia i ke kinoea, hoʻokuʻu i ka reactive huhu radicals. Hoʻouka kēia mau radical i ka ʻili o ka Word.

"ʻO ka pololei o ka ettch wehewehe i ka hana o ka chip. Inā loli kou maʻemaʻe kinoea, e loli ana kāu etch rate, a hāʻule kāu hua."

Ke alakaʻi nei kēia i ka manaʻo o anisotropic ʻokiʻoki—ʻoki pololei i lalo me ka ʻai ʻole i ka ʻaoʻao. Ma ka hui ʻana huhu me nā mea ʻē aʻe Hoʻololi i nā hau, hiki i nā ʻenekinia ke hoʻomalu pono i ka ʻaoʻao o ka auwaha. Pono kēia mana i ko mākou neʻe ʻana i nā node liʻiliʻi (7nm, 5nm, a ma lalo), kahi i hāʻule ʻole ai kahi nanometer o ka deviation.

Pehea e holo ai nā kinoea i loko o ka hana semiconductor i nā kaʻina hana etch holomua?

Nā hana etch he mau mea paahana o ka mea hana. ʻElua ʻano nui: wet etch (hoʻohana i nā kemika wai like hydrogen fluoride) a me ka etch maloʻo (hoʻohana i ka plasma). Hou Advance Semiconcudal ʻaneʻane hilinaʻi wale nā nodes i ka etching plasma maloʻo no ka mea ʻoi aku ka pololei.

Ma kahi maʻamau kiʻi plasma kaʻina, a kinoea fluorinated hookomoia. E nānā kākou i nā ʻano like ʻole i hoʻohana ʻia:

  • Carbon Tetrafluoride (CF4): ʻO ka mea hana no ka oxide etching.
  • Octafluorocyclobutane (C4F8): Hoʻohana ʻia e waiho i kahi papa polymer ma nā ʻaoʻao ʻaoʻao o ka auwaha, e pale ana iā lākou i ka wā e kālai ʻia ai ka lalo.
  • Sulfur Hexafluoride (SF6): ʻIke ʻia no ka wikiwiki ʻana o ke kalakala silika.

ʻO ka pilina ma waena o nā plasma A me ka pani he paʻakikī. Hoʻopili ia i ka pōʻino kino e nā ion a me ka hopena kemika e nā radical. ʻO ka mea hana semiconductor pono e hoʻomalu pono i ke kahe, kaomi, a me ka hui ʻana o kēia mau kinoea. Ina ka ʻO nā wahi kūikawā loaʻa i nā haumia e like me ka makū, hiki iā ia ke hana i ka waika hydrofluoric i loko o nā laina hāʻawi a i ʻole ke keʻena, e hana ai i ka corrosion a me nā pōʻino.

Hoʻopili i ke keʻena etching plasma me ka hoʻohana ʻana i nā kinoea fluorine

No ke aha ʻo Nitrogen Trifluoride ke aliʻi o nā noi hoʻomaʻemaʻe keʻena?

Oiai ke kalai a me ka hoomaemae ana e hele pū me ka lima, ʻo ka hoʻomaʻemaʻe ʻana i nā mea hana e like me ka mea nui e like me ka hana ʻana i ka wafer. I ka wā Kalepa Vipor Vapor (CVD), waiho ʻia nā mea e like me ke silikona a i ʻole tungsten ma luna o ka wafer. Eia naʻe, ua uhi kēia mau mea i nā paia o ke keʻena. Inā hoʻokumu ʻia kēia koena, ʻāwīwī a hāʻule i luna o nā wafers, me nā hemahema.

Komo Nitrogen Trifluoride (NF3).

I nā makahiki i hala aku nei, ua hoʻohana ʻia ka ʻoihana hale ʻōmaʻomaʻo fluorinated kinoea like C2F6 no ka hoʻomaʻemaʻe keʻena. Eia naʻe, ua lilo ʻo NF3 i mea maʻamau no nā hana hoʻomaʻemaʻe keʻena ma muli o kona kūlana kiʻekiʻe. Ke wāwahi ʻia i kahi kumu plasma mamao, hoʻopuka ʻo NF3 i ka nui o nā ʻātoma fluorine. Holoi kēia mau ʻātoma i nā paia o ke keʻena maʻemaʻe, e hoʻohuli i nā koena paʻa i ke kinoea i puhi ʻia i waho.

Nitrogen trifluoride ʻoi aku ka maikaʻi no ka mea ʻoi aku ka nui o ka hoʻohana ʻana (ʻoi aku ka nui o ke kinoea i hoʻohana maoli ʻia) a me nā hoʻokuʻu haʻahaʻa i hoʻohālikelike ʻia me nā mea kahiko. mea hoomaemae. No ka luna hoʻonohonoho, ʻo ia hoʻi ka liʻiliʻi o ka manawa haʻahaʻa no ka mālama ʻana a me ka wikiwiki wikiwiki.

ʻO wai nā pūhui fluorinated pono no ka hana nui?

'Ōlelo kaulahao lako semiconductor hilinaʻi ma kahi hīnaʻi kikoʻī nā kinoea fluorine. Loaʻa i kēlā me kēia me kahi "recipe" a i ʻole noi. Ma ka ʻO Jiangsu Huazhong Gas, ʻike mākou i kahi koi nui no kēia:

inoa kinoea Kumukumu Hoʻohana mua Hiʻona Nui
Kalapona Tetrafluoride CF4 ʻOxide Etch Nui, maʻamau ʻoihana.
Sulfura HexfLhideIo Sf6 Silicon Etch Kiʻekiʻe etch rate, kiʻekiʻe kiʻekiʻe.
Nitrogen trifluoride Nf3 Hoomaemae Keena ʻO ka hana kiʻekiʻe, haʻahaʻa haʻahaʻa.
Octafluorocyclobutane C4F8 Dielectric Etch Polymerizing kinoea no ka pale ʻaoʻao.
Hexafluoroethane C2F6 Oxide Etch / Maʻemaʻe ʻO ke kinoea hoʻoilina, hoʻohana nui ʻia.

HE MEA pūhui fluorinated ke koko ola o hana nui-nui. Me ke kahe mau ʻole o kēia mau mea kinoea ma semiconductor hana, pau na laina. He maʻalahi kēlā. ʻO kēia ke kumu e nānā mau nei nā mea kūʻai aku e like me Eric Miller kahi hoʻokumu no ka hoopilikia ana.

No ke aha ke kinoea maʻemaʻe kiʻekiʻe ka iwi kuamoʻo o ka hua semiconductor?

ʻAʻole hiki iaʻu ke hoʻoikaika nui i kēia: ʻO ka maʻemaʻe nā mea āpau.

Ke kamaʻilio nei mākou ʻO nā mīkini kiʻekiʻe kiʻekiʻe, ʻaʻole mākou e kamaʻilio e pili ana i ka "papa hana" i hoʻohana ʻia no ka wili. Ke kamaʻilio nei mākou e pili ana i 5N (99.999%) a i ʻole 6N (99.9999%) maʻemaʻe.

No ke aha? No ka mea a ʻO ka polokalamu Semicondutory loaʻa nā hiʻohiʻona i ana ʻia i nā nanometer. Hiki i kekahi mole o ka haumia metala a i ʻole ka nui o ka makū (H2O) ke hoʻopōkole a pale paha i ka pili ʻana o kahi papa.

  • Mākū: Pane me huhu e hoʻokumu i ka HF, kahi e hoʻopau ai i ka ʻōnaehana lawe kinoea.
  • Oxygen: Hoʻokahe ʻole ʻia ke silika me ka ʻole.
  • Nā metala kaumaha: E hoʻopau i nā waiwai uila o ka transistor.

Ma ke ʻano he mea hoʻolako, ʻo kā mākou hana e hōʻoia i ka kiʻekiʻe-maʻemaʻe Xenon Oole ʻEleke Papa Nitrous Oxide loaʻa iā ʻoe nā hālāwai koʻikoʻi nā hoʻomaʻemaʻeʻoihana. Hoʻohana mākou i ka chromatography kinoea holomua e ʻike trace incurities iho i nā ʻāpana o ka piliona (ppb). No ka mea kūʻai aku, ʻo ka ʻike ʻana i ka Certificate of Analysis (COA) ʻaʻole ia he pepa wale nō; ʻo ia ka hōʻoiaʻiʻo o kā lākou nā mea hana semiconducor ʻaʻole ia e kū i kahi pōʻino hua.

Ke kālailai ʻepekema ʻepekema i nā kinoea semiconductor maʻemaʻe kiʻekiʻe i loko o kahi lab

Pehea ka mālama ʻana o ka ʻoihana i nā hoʻokuʻu kinoea hoʻomehana honua a me GWP?

Aia kekahi ʻelepani i loko o ka lumi: ke kaiapuni. Nui nā kinoea fluorinated he kiʻekiʻe Hiki ke hoʻomehana honua (GWP). No ka laʻana, Sulfura HexfLhideIo (SF6) kekahi o ka nui loa kinoea hoʻomaʻemaʻe ikaika ʻike ʻia e ke kanaka, me ka GWP mau kaukani manawa kiʻekiʻe ma mua o CO2.

'Ōlelo ʻoihana hana semiconductor aia ma lalo o ke kaomi nui e hōʻemi i kona kapuaʻi kalapona. Ua alakaʻi kēia i ʻelua mau hoʻololi nui:

  1. Hoʻemi: Fabs ke hoʻokomo nei i nā "pahu puhi" nui a i ʻole nā ​​mea holoi ma luna o ko lākou mau laina pau. Hoʻopau kēia mau ʻōnaehana i ka mea i hoʻokō ʻole ʻia Green Bear ma mua o ka hoʻokuʻu ʻia ʻana i ka lewa.
  2. Pani: Ke ʻimi nei nā mea noiʻi i nā mea ʻē aʻe ettch nā kinoea me ka GWP haʻahaʻa. Eia nō naʻe, paʻakikī paʻakikī ka loaʻa ʻana o kahi mole e like me C4F8 a i ʻole SF6 me ka ʻole o ka hopena o ke kaiapuni.

Nitrogen trifluoride he ʻanuʻu i ka ʻaoʻao kūpono no ka hoʻomaʻemaʻe ʻana no ka mea ʻoi aku ka maʻalahi o ka haki ʻana ma mua o nā PFC kahiko. hoʻokuʻu inā e hana pono ana nā ʻōnaehana hoʻomaha. Hoemi ana ʻO nā Emission Gro Gas ʻaʻole ia he hana PR wale nō; he koi hoʻoponopono i ka EU a me US.

Pilikia anei ke kaulahao lako semiconductor i ka hemahema kinoea kūikawā?

Inā ua aʻo mai nā makahiki i hala iā mākou i kekahi mea, ʻo ia ka kahi hoʻokumu he palupalu. Nā mea hana semiconductor ua pilikia nā mea a pau mai neon a hiki i nā fluoropolymers.

Ka lako o kinoea fluorine a ʻo kāna mau mea i loaʻa ma muli o ka ʻeli ʻana o ka fluorspar (calcium fluoride). ʻO Kina kahi kumu honua nui o kēia mea maka. Ke piʻi aʻe nā ʻāʻī geopolitical a i ʻole nā ​​ala logistic e pili ana, hiki ke loaʻa kēia mau mea koʻikoʻi Hoʻololi i nā hau hāʻule, a piʻi nui nā kumukūʻai.

No ka mea kūʻai aku e like me Eric, ʻoiaʻiʻo ka makaʻu o "Force Majeure". No ka hoʻohaʻahaʻa ʻana i kēia, hoʻololi nā ʻoihana savvy i kā lākou mea hoʻolako. Ke ʻimi nei lākou i mau hoa pili i kā lākou iho pahu pahu iso a ua hoʻokumu i nā pūnaewele logistic. Pono i loko logistics he mea nui e like me ka maemae o ke kinoea. Hiki iā ʻoe ke loaʻa ka maʻemaʻe C4F8 kinoea ma ke ao nei, aka, ina ua paa ia ma ke awa, he mea ole ia i ka fab.

He aha nā kaʻina palekana no ka mālama ʻana i ka Hydrogen Fluoride a me nā mea ʻawaʻawa ʻē aʻe?

ʻO ka palekana ke kumu kumu o kā mākou ʻoihana. Nui i loko o ka fluorine ʻO nā kinoea he mea ʻawaʻawa, asphyxiants, a i ʻole ka hoʻoikaika nui ʻana. ʻO ka Hydrogen Fluoride (HF), hoʻohana pinepine ʻia i loko o ka wai etch a i hana ʻia ma ke ʻano he huahana, he mea weliweli loa. Komo ia i loko o ka ʻili a hoʻouka i ke ʻano iwi.

Pono ka hoʻomaʻamaʻa ikaika a me nā mea hana kūikawā no ka mālama ʻana i kēia mau mea.

  • Nā Cylinders: Pono e hōʻoia ʻia ʻo DOT/ISO a nānā mau ʻia no ka ʻino o loko.
  • Nā pāpaʻi: Hoʻohana ʻia nā kiwi diaphragm e pale i ka leakage.
  • Nā mea nānā: Nā mea hana semiconductor uhi ʻia i nā mea ʻike kinoea e hoʻāla ai i nā ʻōuli ma kahi liʻiliʻi liʻiliʻi.

Ke hoʻopiha mākou i kahi cylinder me ʻEleke Papa Nitrous Oxide a i ʻole he etchant ʻawaʻawa, mālama mākou iā ia me he mea kaua i hoʻouka ʻia. Hoʻomaʻamaʻa mākou i ka cylinder i loko o loko e pale i nā ʻāpana a ua hoʻopaʻa ʻia ka valve a hoʻopaʻa ʻia. No kā mākou mea kūʻai, ʻike i ka ʻO nā kaʻa kaʻa a i ʻole hiki mai ka etchant i kahi palekana, ʻo ka hoʻopaʻa ʻana i hoʻopaʻa ʻia he mea hōʻoluʻolu nui.

ʻO ka nānā ʻana i ka palekana o nā pahu kila kila ʻole no ka ʻoihana semiconductor

He aha ka mea e hiki mai ana no nā mea i hoʻohana ʻia i ke kaʻina hana semiconductor?

'Ōlelo Palapala SemiconducTction ʻano ʻino ka palapala alanui. I ka neʻe ʻana o nā pahu i nā hale 3D e like me nā transistors Gate-All-Around (GAA), ka paʻakikī o ke kalai a me ka hoomaemae ana mahuahua. Ke ʻike nei mākou i kahi koi no nā mea ʻē aʻe kinoea fluorinated hui pū ʻia e hiki ke kālai i nā puka hohonu me ka pololei atomika.

ʻO ka Layer Layer Etching (ALE) He ʻenehana hou e hoʻoneʻe ana i hoʻokahi papa atomika i ka manawa. Pono kēia i ka dosing pololei loa o nā mea hoʻonaninani. Eia kekahi, ʻo ka pana ʻana no ka hana "'ōmaʻomaʻo" e alakaʻi i ka lawe ʻana i nā mea hou kemika fluorine e hāʻawi ana i ka hana like me ka haʻahaʻa GWP.

ʻO ka wā e hiki mai ana no ka poʻe hiki ke hana hou i ka synthesis kinoea a me ka hoʻomaʻemaʻe. E like me nā mea semiconductor evolve, pono e evolve nā kinoea i hoʻohana ʻia e hana ai.

ʻO ka hana wafer semiconductor futuristic me nā mea holomua

Nā Kūleʻa Kil

  • He mea nui ka Fluorine: Kemika fluorine ʻo ia ke kī e hiki ai ettch a maʻemaʻe ʻanuʻu i loko ʻO ka hana semiconductor.
  • He Moi ka maemae: Maʻemaʻe kiʻekiʻe (6N) ʻaʻole hiki ke kūkākūkā e pale i nā hemahema a hōʻoia paʻa kaʻina hana.
  • Nā ʻano kinoea: ʻO nā kinoea like ʻole e like me CF4, SF6, a me Nitrogen trifluoride lawelawe i nā kuleana kūikawā ma huahuai.
  • Ka hopena o ke kaiapuni: Hooponopono ʻO nā Emission Gro Gas a hoemi ana he pilikia ʻoihana koʻikoʻi.
  • Hoʻolako palekana: ʻO kahi paʻa kahi hoʻokumu a pono nā hoa hilinaʻi e pale aku i ka pau ʻana o ka hana.

Ma Jiangsu Huazhong Gas, maopopo iā mākou kēia mau pilikia no ka mea ke ola nei mākou i kēlā me kēia lā. Inā makemake ʻoe Xenon maʻemaʻe kiʻekiʻe no kāu kaʻina hana etch hou a i ʻole ka hāʻawi ʻana i nā kinoea ʻenehana maʻamau, eia mākou e kākoʻo i ka ʻenehana e kūkulu nei i ka wā e hiki mai ana.