MālamaʻoʻAmelika Hui PūʻIaʻAmelika Hui PūʻIa
Amania namoni (nh₃) ua hanaʻia me ka hoʻohanaʻana i kaʻenehana hoʻomaʻamaʻa holomua a me ka paʻaʻana o ka mana o ka mea e like me ka mea e like me nā seminity Ua hoʻopiʻi ka huahana me ka National Gb / T 14601-2021
He aha ka hoʻohanaʻana o ka ammoniaʻoihana?
Pan-semiconductor a me ka hana uila
ʻO Chip / panil hana hana: Ua hoʻohanaʻia no Silicon Nitride / Gillium Nitride Model Dilling a me Etching e hōʻoia i ka hana kiʻekiʻe.
ʻO ka hana alakaʻi: Ua hoʻohanaʻia ma keʻano he nitrogen e hana i nā papa epitaxicial e hoʻomaikaʻi ai i ka hana o nā hana māmā.
ʻO ka ikaika hou a me ke kiʻi kiʻi
Nā Kūlana Solar: Hoʻokumu i nā papa heiheiʻo Ati-Vicride ma ke kaʻina PecvD e hoʻomaikaʻi i ke hoʻololi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi.
ʻO ka mālamaʻana a me ka ho'ōlaʻana i ka hanaʻana
ʻO ka nitriding metala
ʻO ka palekana o ka ulding: Ma kahi e hōʻemi ai i ka mīkini e pale ai i ka hoʻololi kiʻekiʻe o nā metala.
Ka palekana a me ka pale kaiāulu
ʻO Dentitrificafication a me ka Hamiss i hōʻemiʻia: Hoʻohanaʻia no ka DISM Dentitrification i ka mana o ka GRUTAL ORTAL ORTUCT / NEXIKIL.
ʻO Synthesy Synthesis
ʻO ka noiʻiʻepekema a me ka mālama olakino
ʻO ka hōʻikeʻo Laboratory: Hoʻohanaʻia e like me ke kaʻa kaʻa kaʻa a iʻole keʻano o ke kaʻa kaʻa no ka noiʻi waiwai a me nā synthesis.
ʻO ka hoʻohālikelike haʻahaʻa haʻahaʻa: kahi kī nui ma keʻano o ke kaʻina hana o nā lako lāʻau e hōʻoia i ka palekana o ka sterile.
Loaʻa nā huahana: hoʻomaʻemaʻeʻia a hiki i 99.999% +, nā mea kūpono ≤0.1ppm, kūpono no ka hana kiʻekiʻe; ʻO ka mea kūʻai aku (cylinder / cylinder / mālama kaʻa kaʻa / tank tank), piha piha palekana palekana palekana palekana palekana.
He aha nāʻanoʻekolu o nāʻoihanaʻoihanaʻoihana?
Hoʻohana: Metal Nitriding paʻakikī, nā kāmeka Chemika (Urea / Nitric Acid)
Nā hiʻohiʻona: hoʻomaʻemaʻe i ka hoʻomaʻemaʻe.
USES: SEIMONDUCT SPPS (Sillicon Nitride Defide), alakaʻi i ka Epitaxial Golls
Nā hiʻohiʻona: hoʻomaʻemaʻe i ka hoʻomaʻemaʻe.
Ka wai wai
Hoʻohana:ʻO ka hana nui nui (e like me nā systication synhetic), nā'ōnaehana denigeration bitritrification.
Nā hiʻohiʻona:ʻO ka mālamaʻana i nā mea e mālama ai i nā mea e pono ai, kiʻekiʻe o ka hoʻokele kiʻekiʻe, kūpono no nā noi nui.
Pehea ka hanaʻana o Jondania?
E kāwele i ka synthes i ke kaʻina hana (ma mua o ka hana haber)
Nā Mea Hana: Hydrogen (H₂, mai keʻano o ke kūlohelohe kūlohelohe / wai uila (nitrogen (N₂, i hanaʻia ma ka hoʻokaʻawaleʻana.
ʻO ka hopena:ʻO nā mea hao i loko o nā mea catalys i ka synthesis o nh₃ ma ke kiʻekiʻe kiʻekiʻe (400-500 ℃) a me ke kiʻekiʻe kiʻekiʻe (15-25MPA).
Ke hoʻomaʻemaʻe
Desulfurization / decarbonzation: E wehe i nā mea nui e like me ka sulfide a me ka cied carbon a me nā molena i hanaʻia.
Hoʻomaʻemaʻeʻiaʻo Amontia
E wehewehe ana i ka heluʻana: E hoʻohana i nā'āpana haʻahaʻa haʻahaʻa (-33
Ke mālama nei a me ka paʻiʻana
Gaseous State: Hoʻopili i ka hoʻopihaʻana i nā cylinders cylinders (40L maʻamau).
ʻO ka moku wai: kūʻai aku i nā pahu pahu mālama a iʻole nā kaʻa kaʻa ma hope o ka wai haʻahaʻa haʻahaʻa e hoʻomaikaʻi i ka hana o kaʻoihana.
Peheaʻo Amonda Classified?
ʻO ka papa inoa ma ka pae hoʻomaʻemaʻe
Papa inoaʻoʻAmelika
MINIFITY: ≥99.9%
USES: Synthesis Synthesis (Urea / Nitric Acid)
Nā hiʻohiʻona:ʻO ka uku haʻahaʻa, kūpono, kūpono no nā hiʻohiʻona maʻamau.
Ua kiʻekiʻeʻo Malama uila
MINIFITY: ≥99.999% (5n papa)
USES: Semiconducorm Modelick Film Filming
Nā hiʻohiʻona:ʻO nā hewa
ʻO ka papa inoa ma keʻano kino
Gasemy ammonia
ʻO nā kākuhi:ʻO nā kila kila kiʻekiʻe kiʻekiʻe
Scenario: Laboratory, kahi hāmeʻa liʻiliʻi, nā lako palekana palekana.
Wai waihoʻoluʻu
Ke waiho nei:ʻOhana haʻahaʻa a me keʻano haʻahaʻa a me ke kūlana kiʻekiʻe, mālama kaʻa kaʻa a iʻole ka hoʻokele kaʻa kaʻa.
Scenarios
Hoʻokaʻawaleʻia e nā wahi noi
Kemika Gondania:ʻO nā mea e pono ai nā mea e like me nā mea e like me ka urea a me ka nitric acid nitric acid.
Nā'ōnaehana uila uila: He lei aliʻi kiʻekiʻe i ka semiconductor, Photovoltaic, a me ka hanaʻana i ka hana.
ʻO ka Amestiana Kaona:ʻO ka Mana Hana Kūʻai / Keʻena Kūʻai Kūʻai Kūʻai a me ke Kemika.
ʻO Memialika Memoni: hoʻohālikelike i nā hoʻohālikelike haʻahaʻa, haʻahaʻa,ʻano loiloi laboractory
Pehea e hana ai ka hale hanaʻoihana?
Nā hopena i ka wā hana a me ka hoʻohanaʻana
ʻO Synthetic Radia: Ke kaʻina hana o ka mīkini,ʻaʻole paʻa nā mea hana i nā lako hana i ka hopena o ka trace leakage.
ʻO ka mea kanu / electrisics / electrisics
Ka waihoʻana a me nā kaʻa kaʻa kaʻa: nā leʻaʻole i hanaʻia e ka wā o ka mālamaʻana o nā pahu ukana
E kāohi i nā ana
Kaohiʻana a me ka kāohi: ADTPT i ke kaʻina hana i hoʻopaʻaʻia, e hoʻouka i ka SCR / AdSorption Tower e mālama i ka hau.
Ka nānāʻana i ka hoʻololiʻana:ʻO ka mea kūʻai akuʻo Gross Gatector + infraed i ka nānāʻana, e hoʻokō ai i nā koi a me nā hoʻoponopono'ē aʻe.
Hāʻawiʻo Huazhong Gas ʻO Amonniaʻo Amonia kiʻekiʻe kiʻekiʻe, ka mālamaʻana i ka ikehu a me nā hana hana kūpono a me ka hana kūpono a me nā hana kūponoʻole a me nā lako. E hoʻokō kā mākou huahana i nā kūlana o ka honua e hōʻoia i nā hopena palekana a hilinaʻi no nā hele āpau o ke ola.
ʻO kahi alakaʻi alakaʻi i ka nitrrogen Trifluoride (NF₃) i ka mīkini Semicondutor e hana nei
ʻO ka meaʻoleʻole
